Publication database
Laser-Ablated Silicon in the Frequency Range From 0.1 to 4.7 THz
The optical performance of high-resistivity silicon with a laser-ablated surface was studied in the transmission mode in the frequency range of 0.1-4.7 THz. A reciprocal relationship between the transmission brightness and the surface roughness was observed at discrete THz frequencies. The measured dispersion was reproduced by the THz wave scattering theory using an effective refractive index model. No significant differences between the samples processed either with psor ns-duration laser pulses in ambient air or in argon enriched atmosphere were found in the THz regime. It was demonstrated that the majority of optical losses of the silicon with the laser modified surface were due to the scattering of THz waves and not due to the absorption in silicon-compounds formed during the laser ablation.
Compact diffractive optics for THz imaging
We present a compact diffractive silicon-based multilevel phase Fresnel lens (MPFL) with up to 50 mm in diameter and a numerical aperture up to 0.86 designed and fabricated for compact terahertz (THz) imaging systems. The laser direct writing technology based on a picosecond laser was used to fabricate diffractive optics on silicon with a different number of phase quantization levels P reaching an almost kinoform spherical surface needed for efficient THz beam focusing. Focusing performance was investigated by measuring Gaussian beam intensity distribution in the focal plane and along the optical axis of the lens. The beam waist and the focal depth for each MPFL were evaluated. The influence of the phase quantization number on the focused beam amplitude was estimated, and the power transmission efficiency reaching more than 90% was revealed. The THz imaging of less than 1 mm using a robust 50 mm diameter multilevel THz lens was achieved and demonstrated at 580 GHz frequency.
Fibonacci terahertz imaging by silicon diffractive optics
Fibonacci or bifocal terahertz (THz) imaging is demonstrated experimentally employing a silicon diffractive zone plate in continuous wave mode. Images simultaneously recorded in two different planes are exhibited at 0.6 THz frequency with the spatial resolution of wavelength. Multifocus imaging operation of the Fibonacci lens is compared with a performance of the conventional silicon phase zone plate. Spatial profiles and focal depth features are discussed varying the frequency from 0.3 to 0.6 THz. Good agreement between experimental results and simulation data is revealed.
Laser processing for precise fabrication of the THz optics
Zone plates with integrated band-pass filters and binary Fresnel lenses designed for the THz spectral range were fabricated by direct laser ablation in metal films and the silicon substrate. Results on the process performance and quality of the products are reviewed. The focusing performance was measured using the THz source that produces the 580 GHz radiation. The beam was directed to the centre of the fabricated optical elements. Zone plates with integrated band-pass filters have shown the double performance in focusing and spectral selection. The dependence of ablation rate and surface roughness on the laser process parameters was thoroughly investigated on the silicon. The depth of the ablated grooves linearly depends on the number of laser scans number with a particular slope for each scanning speed. The process regime with the 125 mm/s scanning speed provided the most precise control over the ablation depth. The topography measurements of the laser fabricated multilevel phase zone plates (Fresnel lenses) with the 10 mm focal length showed good agreement with the calculated topography. The intensity distribution of the focus spots using the laser fabricated 2, 4 and 8 level binary Fresnel lenses showed better focusing performance when more depth levels were applied in the lens production.