Unique laser systems for extreme applications:
- OPCPA
- Plasma physics
- Laser shock peening
- Tunable wavelength femtosecond OPCPA system
- 750 – 960 nm, 375 – 480 nm, 250 – 320 nm and 210 – 230 nm tuning ranges
- Up to 14 mJ pulse energy at 1 kHz repetition rate
- Perfectly synchronized fs and ps outputs option
- Based on the novel OPCPA technology
- Patented front-end design
- Up to 100 Hz repetition rate
- Up to 1 J pulse energy
- Down to 10 fs pulse duration
- > 15 TW peak power
- sub-8 fs pulse duration
- 1 kHz repetition rate
- > 120 mJ output energy
- > 120 W average power
- Pulse energies up to 2.2 J
- 20 – 300 ps pulse duration
- 10 Hz pulse repetition rate
- Flash lamp pumped picosecond amplifiers
- Diode pumped regenerative amplifier
- Pulse energies up to 150 mJ
- 20 – 300 ps pulse duration
- Up to 2 kHz pulse repetition rate
- Diode pumped solid state design picosecond amplifiers
- Flash lamp pumped
4 channels × 2200 mJ @ 10 Hz - Diode pumped
8 channels × 130 mJ @ 1 kHz - Each of the channels can be tailored according to pumping requirements
- 20 – 300 ps pulse duration
- Diode-pumped, self-seeded Single Longitudinal Mode (SLM) master oscillator
- Up to 10 J pulse energies
- 2 – 25 ns pulse durations
- 10 Hz pulse repetition rate
- High energy nanosecond lasers
- Up to 10 J pulse energies
- 5 ns pulse duration
- 10 or 20 Hz pulse repetition rate
- Better than 0.5% RMS pulse energy stability
- Up to 3.7 J at 1064 nm output pulse energy
- Up to 1 kHz repetition rate
- Multi-channel version 2 J per channel at 1064 nm
- Pulse durations from 2 ns to 500 ns
- Burst version available
- High energy nanosecond lasers
- Temporally shaped pulses
- Up to 10 J pulse energies
- 10 Hz pulse repetition rate
- Arbitrary waveform generator for pulse shaping
- Up to 80 J from a single channel
- Pulse durations from 100 ps to 20 ns
- Spatial Super-Gaussian beam profile
- Second and third harmonics generators