FemtoLux
Industrial Femtosecond Lasers
FemtoLux is designed from the get-go for maximum reliability, seamless integration and non-stop 24/7/365 zero maintenance operation with innovative ”dry” cooling. Wide range of options enable to tailor this ultrafast laser for desired material processing tasks.
Features
- At 1030 nm
50 W typical max output power
> 300 µJ typical max output energy - At 515 nm
20 W typical max output power
> 50 µJ typical max output energy - At 343 nm
10 W typical max output power
> 25 µJ typical max output energy - High energy version available (1 mJ at 10 kHz)
- > 750 µJ in a burst mode
- < 350 fs – 1 ps
- Pulse duration extension up to 1 ns
- Single shot to 4 MHz (AOM controlled)
- MHz, GHz, MHz+GHz burst modes
- Pulse-on-demand (PoD), with jitter as low as 20 ns (peak-to-peak)
- < 0.5% RMS power long term stability over 100 hours
- M² < 1.2
- Beam circularity > 0.85
- Zero maintenance
- Dry cooling (no water used)
- PSU and cooling unit integrated into single 4U rack housing
- Easy and quick installation
- Compatible with galvo and Polygon scanners as well as PSO controllers
A reliable & versatile tool for micromachining
Designed from the get-go for maximum reliability, seamless integration and non-stop 24/7/365 zero maintenance operation with innovative ”dry” cooling.
The FemtoLux femtosecond laser has a tunable pulse duration from <350 fs to 1 ps and can operate in a broad AOM controlled range of pulse repetition rates from a single shot to 4 MHz.
The maximum pulse energy is more than 300 μJ operating with single pulses and can reach more than 750 µJ in burst mode, ensuring higher ablation rates and processing throughput for different materials.
The FemtoLux beam parameters will meet the requirements of the most demanding materials and micro-machining applications.
Innovative laser control electronics ensure simple control of the FemtoLux laser by external controllers that could run on different platforms, be it Windows, Linux or others using REST API commands.
This makes easy integration and reduces the time and human resources required to integrate this laser into any laser micromachining equipment.
Seamless user experience
- Easy integration – remote control using REST API via RS232 and LAN.
- Reduced integration time – demo electronics is available for laser control programming in advance.
- Easy and quick installation – no water, fully disconnectable laser head. Can be installed by the end-user.
- Easy troubleshooting – integrated detectors and constant system status logging.
- No periodic maintenance required.
Innovative “Dry” Cooling System
The FemtoLux laser employs an innovative cooling system and sets new reliability standards among industrial femtosecond lasers. No additional bulky and heavy water chiller is needed.
The chiller requires periodic maintenance – cooling system draining and rinsing and water and particle filter replacement. Moreover, water leakage can cause damage to the laser head and other equipment. Instead of using water for transferring heat from a laser head, the FemtoLux laser uses an innovative Direct Refrigerant Cooling method.
The refrigerant agent circulates from a PSU-integrated compressor and condenser, to a cooling plate via armored flexible lines.
The entire cooling circuit is permanently hermetically sealed and requires no maintenance.
Direct refrigerant cooling system features
- Military-grade reliability
- Permanently hermetically sealed system >90,000 hour MTBF
- No maintenance
- High cooling efficiency
- >45% lower power consumption compared to water cooling equipment
- Compact and light
Simple & reliable cooling plate attachment
The cooling plate is detachable from the laser head for more convenient laser installation. The laser cooling equipment is integrated with the laser power supply unit into a single 4U rack-mounted housing with a total weight of 15 kg.
Specifications
Model | FemtoLux 30 | FemtoLux 50 |
---|---|---|
Main Specifications 1) | ||
Central wavelength | ||
Fundamental | 1030 nm | 1030 nm |
With second harmonic option | 515 nm | 515 nm |
With third harmonic option | 343 nm | 343 nm |
Pulse Repetition Rate (PRR) 2) | 200 kHz – 4 MHz | 100 kHz – 2 MHz |
Pulse repetition frequency (PRF) after frequency divider | PRF = PRR / N, N=1, 2, 3, … , 65000; single shot | PRF = PRR / N, N=1, 2, 3, … , 65000; single shot |
Average output power | ||
At 1030 nm 3) | > 27 W (typical 30 W) | > 45 W (typical 50 W) |
At 515 nm | > 11 W 4) | > 20 W 5) |
At 343 nm | > 6 W 4) | > 10 W 5) |
Pulse energy | ||
At 1030 nm | > 100 µJ or 1 mJ 6) | > 300 µJ 7) |
At 515 nm | > 55 µJ 4) | > 50 µJ 5) |
At 343 nm | > 30 µJ 4) | > 25 µJ 5) |
Number of pulses in MHz burst 8) | 2 – 10 | 2 – 10 |
Total energy in burst mode 9) | > 450 µJ | > 750 µJ |
Power long term stability (Std. dev.) 10) | < 0.5 % | < 0.5 % |
Pulse energy stability (Std. dev.) 11) | < 1 % | < 1 % |
Pulse duration (FWHM) @ 1 MHz | Tunable, < 350 fs 12) – 1 ps 13) | Tunable, < 400 fs 12) – 1 ps 13) |
Optional pulse duration extension | tunable, up to 1 ns | tunable, up to 1 ns |
Beam quality | M2 < 1.2 (typical < 1.1) | M2 < 1.2 (typical < 1.1) |
Beam circularity, far field | > 0.85 | > 0.85 |
Beam divergence (full angle) | < 1 mrad | < 1 mrad |
Beam pointing thermal stability | < 20 µrad/°C | < 20 µrad/°C |
Beam diameter (1/e2) at 1030 nm | 2.5 ± 0.4 mm @ 65 cm | 2.5 ± 0.4 mm @ 65 cm |
Polarization | vertical | vertical |
Triggering mode | internal / external | internal / external |
Pulse output control | frequency divider, pulse picker, burst mode, packet triggering, power attenuation, pulse-on-demand 14) | frequency divider, pulse picker, burst mode, packet triggering, power attenuation, pulse-on-demand 14) |
Control interfaces | RS232 / LAN | RS232 / LAN |
Length of the umbilical cord | 3 m, detachable | 3 m, detachable |
Laser head cooling type | dry (direct refrigerant cooling through detachable cooling plate) | dry (direct refrigerant cooling through detachable cooling plate) |
Physical characteristics | ||
Laser head (W × L × H) | 434 × 569 × 150 mm | 434 × 569 × 150 mm |
Power supply unit (W × L × H) | 449 × 496 × 177 mm | 449 × 496 × 177 mm |
Operating Requirements | ||
Mains requirements | 100 – 240 V AC, single phase, 50/60 Hz | 100 – 240 V AC, single phase, 50/60 Hz |
Maximal power rating | 800 W | 800 W |
Operating ambient temperature | 18 – 27 °C | 18 – 27 °C |
Relative humidity | 10 – 80 % (non-condensing) | 10 – 80 % (non-condensing) |
Air contamination level | ISO 9 (room air) or better | ISO 9 (room air) or better |
Model | FemtoLux 30 | FemtoLux 50 |
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- Due to continuous improvement, all specifications are subject to change without notice. Parameters marked typical are not specifications. They are indications of typical performance and will vary with each unit we manufacture. All parameters are specified for a shortest pulse duration. Unless stated otherwise, all specifications are measured at 1030 nm and for basic system without options.
- When frequency divider is set to transmit every pulse. Fully controllable by integrated AOM.
- At 1 MHz.
- At 200 kHz.
- At 400 kHz.
- Other combinations of energy and repetition rate available.
- At 100 kHz.
- Oscillator frequency ~50 MHz, ~20 ns separation between pulses.
- MHz burst mode or MHz+GHz burst mode at 50 kHz PRR.
- Over 100 h after warm-up under constant environmental conditions.
- Under constant environmental conditions.
- At PRR > 500 kHz. At PRR < 500 kHz shortest pulse duration is < 400 fs.
- Custom pulse duration by request. For example – fixed 50 fs available.
- Optional feature. Jitter < 20 ns. Trigger-to-pulse delay < 1 µs.
Benefits
- Jitter lower than 20 ns ensures consistent and equidistant pulse spacing for high-speed micromachining
- Adjustable repetition rate for processing complex geometries
- Faster processing speeds, increased productivity
PoD feature enables the laser to fire a pulse only when required, rather than at a constant rate, enabling precise control over the laser’s output and resulting in higher efficiency, accuracy and quality.
This capability is especially valuable in various micromachining applications where a high processing speed, constant energy, and accuracy are essential. To follow complex curvature at high speed and to maintain equidistant spacing it is necessary to ensure that the repetition rate of the pulses is adjusted. To achieve these requirements, it is necessary to ensure that the repetition rate of the pulses is adjusted to follow complex curvature at high speed and to maintain equidistant spacing. One may try to use position based laser triggering but, due to laser system limitations, the jitter will be from several μs to tens of μs, which will result in random spacing of the pulses.
On the other hand, the usage of time based laser triggering results in overheat areas, due to excessive overlap of pulses. The FemtoLux laser has the pulse-on-demand feature with jitter as low as 20 ns (peak-to-peak), and it can therefore tackle all the challenges and maximize process efficiency, precision and quality at high speed.
Traditional laser triggering techniques struggle to maintain equally spaced pulses at high speeds (Fig.1, 2). Pulse-on-demand feature tackles this challenge and enables high-speed micromachining (Fig. 3).
Benefits
- Any desired intra-burst PRR can be achieved independently from the initial PRR of the master oscillator
- Identical pulse separation inside the GHz bursts is maintained
- Short- and long-burst formation modes can be provided.
– A short burst is up to about 10 ns burst width (from 2 to tens of pulses in the GHz burst).
– A long burst is from ~20 ns up to a few hundred ns in burst width (from tens to thousands of pulses in the GHz burst) - MHz+GHz burst mode
- An adjustable amplitude envelope of the GHz bursts is provided
- No pre/post pulses in GHz burst. Pure GHz bursts
- Ultrashort pulse duration is maintained inside the bursts
Patent-Pending Method for Ultra-High Rate Bursts
The Femtolux laser can operate in the single-pulse mode, MHz burst mode, GHz burst mode, and MHz + GHz burst mode.
The burst formation technique based on the use of the AFL is a very versatile method as it allows to overcome many limitations encountered by other fiber- and/or solid-state-based techniques.
A new versatile patent-pending method to form ultra-high repetition rate bursts of ultrashort laser pulses. The developed method is based on the use of an all-in-fiber active fiber loop (AFL). A detailed description of the invention can be found on:
- Tadas Bartulevičius, Mykolas Lipnickas, Virginija Petrauskienė, Karolis Madeikis, and Andrejus Michailovas, (2022), “30 W-average-power femtosecond NIR laser operating in a flexible GHz‑burst-regime,” Opt. Express 30, 36849-36862. DOI: 10.1364/OE.472907.
- Andrejus Michailovas, and Tadas Bartulevičius. 2021 Int. patent application published under the Patent Cooperation Treaty (PCT) WO2021059003A1.
Short GHz burst
Long GHz burst
MHz + GHz burst mode
Specifications
Main Specifications | ||
Burst repetition rate | up to 650 kHz | |
Intra-burst pulse repetition rate 1) | 2 GHz | |
GHz Burst Mode | short | long |
GHz burst length | 0.5 – 10 ns | 20 – 500 ns |
Number of pulses 2) | 2 – 20 | 40 – 1000 |
Shape | square, rising, falling | falling, pre-shaped 3) |
MHz + GHz Burst Mode | ||
Number of pulses in MHz burst | 2 – 10 | |
Number of pulses in GHz burst 2) | 2 – 20 |
- Custom intra-pulse PRR is available upon a request.
- Depends on the intra-pulse PRR.
- For more information, please inquire sales@ekspla.com.
FemtoLux 50 performance
FemtoLux 30 performance
FemtoLux 30 stability
Drawings
Laser control application
Ekspla Control Application is a software tool intended for day-to-day routine operation control. It is used to control the laser in API level through LAN or RS-232 communication types, the control capabilities are stored in the laser system itself, software is self-adaptive to the system, one application can be used with multiple systems and can run on different platforms – be it Windows, Linux or others using REST API commands.
Applications
Publications
The ultrafast burst laser ablation of metals: Speed and quality come together
Utilisation of high-power ultrafast laser for ablation-based industrial processes such as milling, drilling or cutting requires high production rates and superior quality. In this paper, we demonstrate highly efficient, rapid and high-quality laser micro-machining of three industrial metals (aluminium, copper, and stainless steel). Our proposed optimisation methods of pulse energy division in time result in simultaneous enhancement of ablation efficiency (volume per energy) and ablation rate (volume per time) while maintaining a focused laser beam on the target surface and high resolution. A high-tech femtosecond burst laser, producing laser pulses of τ = 350 fs duration and intra-burst repetition rates of fP = 50 MHz, was employed in the experiments. Due to the utilisation of bursts, material removal efficiency and removal rate were increased by 18.0 %, 44.5 %, and 37.0 % for aluminium, copper, and stainless steel if compared with the best performance of single-pulses. In addition to the high processing rate, processing by burst mode resulted in lower surface roughness. This technique is believed to be a solution enabling extremely high femtosecond laser powers for precise microfabrication.
Ultrashort Pulse Bursts for Surface Laser Polishing
Laser polishing offers numerous advantages, one of which is the convenience of using the same system for the
whole manufacturing process. In this work, an ultrashort pulse laser operating in a GHz burst regime was used to polish
stainless steel. The aim was to minimise surface roughness, characterised by the average roughness parameter Ra. Different
laser processing parameters (average laser power, number of pulses per burst, scanning speed, hatch size) were varied to polish
samples that were covered in laser-induced periodic surface structures (LIPSS). Thermal effects, such as melt layer formation,
were noticed and discussed. It was demonstrated that LIPSS can be erased and the initial surface roughness of 73 nm was
reduced to 41 nm using 100 pulses per burst and burst fluence of FB = 0.15 J/cm2.
Femtosecond Laser Cutting of 110–550 µm Thickness Borosilicate Glass in Ambient Air and Water
The cutting quality and strength of strips cut with femtosecond-duration pulses were investigated for different thicknesses of borosilicate glass plates. The laser pulse duration was 350 fs, and cutting was performed in two environments: ambient air and water. When cutting in water, a thin flowing layer of water was formed at the front surface of the glass plate by spraying water mist next to a laser ablation zone. The energy of pulses greatly exceeded the critical self-focusing threshold in water, creating conditions favorable for laser beam filament formation. Laser cutting parameters were individually optimized for different glass thicknesses (110–550 µm). The results revealed that laser cutting of borosilicate glass in water is favorable for thicker glass (300–550 µm) thanks to higher cutting quality, higher effective cutting speed, and characteristic strength. On the other hand, cutting ultrathin glass plates (110 µm thickness) demonstrated almost identical performance and cutting quality results in both environments. In this paper, we studied cut-edge defect widths, cut-sidewall roughness, cutting throughput, characteristic strength, and band-like damage formed at the back surface of laser-cut glass strips.
GaAs ablation with ultrashort laser pulses in ambient air and water environments
Water-assisted ultrashort laser pulse processing of semiconductor materials is a promising technique to diminish heat accumulation and improve process quality. In this study, we investigate femtosecond laser ablation of deep trenches in GaAs, an important optoelectronic material, using water and ambient air environments at different laser processing regimes. We perform a comprehensive analysis of ablated trenches, including surface morphological analysis, atomic-resolution transmission electron microscopy imaging, elemental mapping, photoluminescence, and Raman spectroscopy. The findings demonstrate that GaAs ablation efficiency is enhanced in a water environment while heat-accumulation-related damage is reduced. Raman spectroscopy reveals a decrease in the broad feature associated with amorphous GaAs surface layers during water-assisted laser processing, suggesting that a higher material quality in deep trenches can be achieved using a water environment.
Versatile ultrashort pulse laser tunable up to nanosecond range
A new versatile patent-pending technology enabling new operation regimes and a unique set of features in the industrialgrade 30 W-level average power femtosecond hybrid laser is introduced in this work. The developed technology, based on the use of an all-in-fiber active fiber loop (AFL), enabled to form GHz bursts of ultrashort laser pulses with any desired pulse repetition rate and any number of pulses in a burst with identical intra-burst pulse separation. Furthermore, the AFL allowed to tune pulse duration from a few hundred femtoseconds to picoseconds and even up to the nanosecond range.
30 W-average-power femtosecond NIR laser operating in a flexible GHz-burst-regime
Laser sources which produce GHz bursts of ultrashort pulses attract a lot of attention by demonstrating superior performance in material processing. Flexibility of the laser source in a selection of parameters for custom application is highly preferable. In this work, we demonstrate a very versatile method for burst formation using the active fiber loop (AFL). It allows forming GHz bursts containing from 2 up to approximately 2200 pulses in a burst (1000 ns burst width) with identical pulse separation and any predefined intra-burst pulse repetition rate (PRR). The burst pre-shaping by the amplification conditions in the AFL and by the modulation of transmission of the acousto-optic modulator was demonstrated. Industrial-grade ultrafast laser system was able to operate in the single-pulse and GHz-burst regimes. The laser system delivered high-quality 368 fs duration (FWHM) pulses of 15.3 µJ pulse energy and 30.6 W average output power at 2 MHz PRR in the single-pulse regime. In the GHz-burst operation regime, bursts of 2.2 GHz intra-burst repetition rate were formed and amplified to more than 30 W average output power with a burst energy up to 135 µJ at a burst repetition rate of 200 kHz. The sub-picosecond duration of pulses was obtained in the GHz-burst regime at different burst widths.
Spatially Variable Wave Plate for Depolarization Compensation Induced in High-Power Yb:YAG Amplifier
In this work we present a novel method for depolarization compensation based on spatially variable wave plate. Thermally induced depolarization losses were reduced from 14.3% to 1.3% and bifocusing eliminated in a double-pass Yb:YAG amplifier.
Depolarization compensation with a spatially variable wave plate in a 116 W, 441 fs, 1 MHz Yb:YAG double-pass laser amplifier
A subpicosecond laser system featuring a fiber chirped pulse amplification-based seed laser and a double-pass end-pumped Yb:YAG crystal power amplifier was investigated. The key novelty of the system was the application of depolarization compensation using a specially designed spatially variable wave plate. To the best of our knowledge, this method was applied for the first time. The presented laser system produced pulses of 441 fs duration, 116 µJ pulse energy at 116 W average power with a beam quality of M2∼2.1, featured optical-to-optical efficiency of 32% at room temperature (T=20°C), and had residual depolarization level of 2.7%.
EKSPLA: Reliability redefined: a new 30W femtosecond laser with zero maintenance
FemtoLux 30 is a new 30 W femtosecond industrial grade laser build to work 24/7/365 without any interruptions. Other lasers of similar optical power use water for cooling, which means additional bulky and heavy water chiller is needed which require periodical maintenance (cooling system draining and rinsing, water and particle filter replacement). Moreover, in the unfortunate event of water leakage, not only laser head but also more expensive equipment could be damaged. FemtoLux 30 uses innovative direct refrigerant cooling method that do not contain any water inside the laser head and has much higher cooling efficiency. Laser cooling equipment is integrated together with the power supply unit into a single 4U rack mounted housing with a total weight of just < 15 kg. To tailor laser for specific applications, FemtoLux 30 laser has a tunable pulse duration from < 350 fs to 1 ps and can operate in very broad AOM controlled range of pulse repetition rate from a single shot to 4 MHz. While max energy of >250 µJ, that could be achieved while operating in a burst mode, could ensure higher ablation rates for different materials. FemtoLux 30 is designed as perfect tool for display and microelectronics manufacturing, as well as for micro processing and marking of brittle materials, such as glass, sapphire or ceramics, as well as for highest quality micro processing of different metals and polymers. Innovative laser control electronics ensures easy control of FemtoLux30, thus reducing time and resources required for integrating this laser into different equipment.
Numerical model of end-pumped Yb:YAG double-pass laser amplifier experimentally validated at 129 W output power
In this work, a double-pass end-pumped Yb:YAG amplifier system was investigated experimentally and numerically. The amplifier was seeded by a fibre-CPA based seed laser FemtoLux 30 (Ekspla). The presented laser system produced 129 W average power and 129 μJ energy pulses at 1 MHz pulse repetition rate, with optical-to-optical efficiency of 32% at room temperature (T = 20°C). The resulting beam quality was M2 ∼ 2.1 and the measured depolarization losses were to 17.9%. After the compression, 441 fs pulse duration was achieved. During the work, comprehensive amplifier modelling was performed using the code written in Matlab. The modelling results matched well the experimental data, providing the tool to predict the performance of laser systems based on ytterbium-doped isotropic crystalline, ceramic and glass laser materials prior to designing and manufacturing.