PL2210 series

Diode Pumped Picosecond kHz Pulsed Nd:YAG Lasers
  • kHz range mode-locked lasers
  • Up to 5 mJ
  • 20 – 80 ps pulses
  • 1 kHz pulse repetition rate
  • kHz range mode-locked lasers
  • Up to 5 mJ
  • 20 – 80 ps pulses
  • 1 kHz pulse repetition rate

Features & Applications


  • High pulse energy at kHz rates
  • Diode pumped solid state design
  • Air cooled – external water supply is not required
  • Turn-key operation
  • Low maintenance costs
  • Optional streak camera triggering pulse with <10 ps rms jitter
  • Remote control pad
  • PC control via USB with supplied LabVIEW™ drivers
  • Optional temperature stabilized second, third and fourth harmonic generators


  • Time resolved fluorescence, pump-probe spectroscopy
  • OPG/OPA/OPO pumping
  • Remote Laser Sensing
  • Other spectroscopic and nonlinear optics applications


PL2210 series diode-pumped, air-cooled, mode-locked Nd:YAG lasers provide picosecond pulses at a kilohertz pulse repetition rate. Short pulse duration, excellent pulse-to-pulse stability, superior beam quality makes PL2210 series diode pumped picosecond lasers well suited for many applications, including material processing, time-resolved spectroscopy, optical parametric generator pumping, and other tasks.

Flexible design

PL2210 series lasers offer a number of optional items that extend the capabilities of the laser. A pulse picker option allows control of
the pulse repetition rate of the laser and operation in single-shot mode. The repetition rate and timing of pulses can be locked to an external RF source (with –PLL option) or other ultrafast laser system (with –FS option). The laser provides a triggering pulse for synchronization of the customer‘s equipment. A low jitter SYNC OUT pulse has a lead up to 500 ns that can be adjusted in ~0.25 ns steps from a PC. 

Up to 400 μs lead of triggering pulse is available as a PRETRIG standard feature that is designed to provide precise, very low jitter trigger pulses for a streak camera.

Built-in harmonic generators

Automated angle-tuned non-linear crystals mounted in temperature stabilized heaters are used for second, third and fourth high spectral purity harmonic generation.

Simple and convenient laser control

The laser can be operated from personal computer through USB (RS-232 is optional) interface using supplied LabVIEW™ drivers or from remote control pad with backlit display that is easy to read even while wearing laser safety glasses.

Available models

PL2210A-1kUp to 900 μJ, 28 ps pulses at an up to 1 kHz repetition rate
PL2211Up to 2.5 mJ energy at a 1 kHz repetition rate at 28 ps pulses
PL2211AUp to 5 mJ energy at a 1 kHz repetition rate at 28 ps pulses

Custom products, tailored for specific applications 1)

PL2210A-2kUp to 400 μJ, 28 ps pulses at an up to 2 kHz repetition rate
PL2210BUp to 2.5 mJ energy at a 1 kHz repetition rate at 80 ps pulses
PL2210B-TRModel, in addition to a 1 kHz pulse train, has an output of 88 MHz pulse train with 5 W average power that can be used for pumping synchronously pumped OPOs
  1. Inquire for other specifications. Custom-built models with higher pulse energy are available on request.


Output energy
    at 1064 nm 0.9 mJ2.5 mJ5 mJ
    at 532 nm 2) 0.45 mJ1.3 mJ2.5 mJ
    at 355 nm 3)0.35 mJ0.8 mJ1.6 mJ
    at 266 nm 4)0.16 mJ0.5 mJ1 mJ
Pulse energy stability (Std. Dev) 5)
    at 1064 nm0.5 %
    at 532 nm0.8 %
    at 355 nm1 %
    at 266 nm2 %
Pulse duration (FWHM) 6)28 ps ± 10 %
Pulse repetition rate1 kHz
Triggering modeinternal/external
Typical TRIG1 OUT pulse delay 8)-500...50 ns
TRIG1 OUT pulse jitter<0.1 ns rms
Spatial mode 9)Close to Gaussian
Beam divergence 10)<1 mrad
Beam diameter 11)1.7 ± 0.3 mm
Beam pointing stability 12)<30 μrad
Pre-pulse contrast>200:1
Polarizationlinear, >100:1
Laser head size (W × L × H) 13)456 × 1031 × 249 mm
Power supply size (W × L × H)365 × 392 × 290 mm550 × 600 × 550 ±3 mm (19″ standard, MR-9)
Water service not required, air cooled
Relative humidity 20 – 80 % (non condensing)
Ambient temperature 22 ± 2 °C
Power requirements100 – 240 V AC, single phase 50/60 Hz
Power consumption 14)<1 kW<1.5 kW
  1. Due to continuous improvement, all specifications are subject to change without notice. Parameters marked typical are not specifications. They are indications of typical performance and will vary with each unit we manufacture. Unless stated otherwise, all specifications are measured at 1064 nm and for basic system without options.
  2. For PL2210 series laser with –SH, -SH/TH, -SH/FH or -SH/TH/FH option. Outputs are not simultaneous.
  3. For PL2210 series laser with –TH, -SH/TH or -SH/TH/FH option. Outputs are not simultaneous.
  4. For PL2210 series laser with -SH/FH or -SH/TH/FH option. Outputs are not simultaneous.
  5. Averaged from pulses, emitted during 30 sec time interval.
  6. Optional 80 or 22 ps ± 10% duration. Pulse energy specifications may differ from indicated here.
  7. With respect to optical pulse. <10 ps rms jitter is provided with PRETRIG standard feature.
  8. TRIG1 OUT lead or delay can be adjusted with 0.25 ns steps in specified range.
  9. Near field Gaussian fit is >90%.
  10. Average of X- and Y-plane full angle divergence values measured at the 1/e² level at 1064 nm.
  11. Beam diameter is measured at 1064 nm at the 1/e² point.
  12. Beam pointing stability is evaluated from fluctuations of beam centroid position in the far field.
  13. 456×1233×249 mm (W×L×H) laser head size might be required for some optional configurations.
  14. At 1 kHz pulse repetition rate.

Note: Laser must be connected to the mains electricity all the time. If there will be no mains electricity for longer that 1 hour then laser (system) needs warm up for a few hours before switching on.



Provides low jitter pulse for streak camera triggering with lead/delay in -400…600 μs range and <10 ps rms jitter.

Option P80

Provides 80 ps ± 10 % output pulse duration. Inquire for pulse energy specifications.

Option P20

Provides 22 ps ± 10 % output pulse duration. Inquire for pulse energy specifications.

Option PC

Allows reduction of the pulse repetition rate of the PL2210 series laser by integer numbers. Single shot mode is also possible. In addition, the –PC option reduces the low-intensity quasi-CW background that is present at laser output at 1064 nm wavelength. Please note that the output of fundamental wavelength and harmonics will be reduced by approx. 20% with installation of the –PC option.

Performance & Drawings


Found total :
1 article, 1 selected
Application selected :
All Applications
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Material Processing (Industrial)
Selective Laser Oxidation

Picosecond laser registration of interference pattern by oxidation of thin Cr films

Related applications:  Material Processing (Industrial) Selective Laser Oxidation

Authors:  V. Veiko, M. Yarchuk, R. Zakoldaev, M. Gedvilas, G. Račiukaitis, M. Kuzivanov, A. Baranov

The laser oxidation of thin metallic films followed by its selective chemical etching is a promising method for the formation of binary metal structures on the glass substrates. It is important to confirm that even a single ultrashort laser pulse irradiation is able to create the protective oxide layer that makes possible to imprint the thermochemical image.

Results of the thermo-chemical treatment of thin chromium films irradiated by picosecond laser pulse utilizing two and four beam interference combined with the chemical etching are presented. The spatial resolution of this method can be high enough due to thermo-chemical sharpening and can be close to the diffraction limit. Micro-Raman spectroscopy was applied for characterization of the chemical composition of the protective oxide layers formed under atmospheric conditions on the surface of thin chromium films.

Published: 2017.   Source: Applied Surface Science, 404, 63-66 (2017)

Ordering information

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