FemtoLux 3

Microjoule Class Femtosecond Industrial Lasers
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datasheet
  • Up to 3 W at 1030 nm or 1.5 W at 515 nm
  • Up to 3 μJ/pulse and 10 μJ/burst
  • 300 fs – 5 ps tunable pulse duration
  • Single shot – 5 MHz pulse repetition rates
  • Burst shape active control
  • Up to 3 W at 1030 nm or 1.5 W at 515 nm
  • Up to 3 μJ/pulse and 10 μJ/burst
  • 300 fs – 5 ps tunable pulse duration
  • Single shot – 5 MHz pulse repetition rates
  • Burst shape active control

Features & Applications

Features

  • 300 fs … 5 ps tunable pulse duration
  • Output power 3 W at 1030 nm or 1.5 W at 515 nm
  • Up to 3 μJ/pulse and 10 μJ/burst (at 1030 nm)
  • Up to 1.5 µJ/pulse and 5 µJ/burst (at 515 nm)
  • Excellent beam quality M² < 1.2
  • Versatile laser control and syncronisation capabilities
  • Up to 5 MHz pulse repetition rate
  • Smart triggering for synchronous operation with polygon scanner and PSO
  • Burst shape control
  • Passive air cooling of the laser head
  • 24/7 operation

Applications

  • Inner volume marking of transparent materials
  • Marking and structuring
  • Micromachining of brittle materials
  • Photopolymerization
  • Ophthalmologic surgery
  • Biological Imaging
  • Pumping of femtosecond
  • OPO/OPA
  • Microscopy

Description

FemtoLux 3 is a modern femtosecond fiber laser aimed for both R&D use and industrial integration. Tunable pulse duration in a range of 300 fs – 5 ps, adjustable pulse repetition rate up to 5 MHz and adjustable pulse energy up to 3 μJ allows optimization of laser parameters for the desired application. These include marking and volume structuring of transparent materials, photopolymerization, biological imaging, nonlinear microscopy and many others. To expand the scope of applications even further this laser can be equipped with a second harmonics module.

With burst mode enabled, FemtoLux 3 can generate bursts of pulses with energy above 10 μJ with instant burst shape control which can significantly improve the efficiency of some processes.

Having a rigid, compact, passive air-cooled laser head and the possibility to control the laser from a wireless tablet, FemtoLux 3 can be integrated with different equipment, be it laser equipment for material micro-processing, microscopy or any other research equipment.

Specifications

ModelFemtoLux 3
MAIN SPECIFICATIONS 1)
Central wavelength
    Fundamental1030 ± 2 nm
    With second harmonic option515 ± 1 nm
Minimal pulse duration (FWHM) at 1030 nm< 300 fs (typical ~230 fs)
Pulse duration tuning range300 fs – 5 ps
Maximal average output power 2)
    at 1030 nm> 3 W
    at 515 nm> 1.5 W
Power long term stability (StdDev) 3)≤ 0.5 %
Maximal pulse energy 2)
    at 1030 nm> 3 μJ
    at 515 nm> 1.5 μJ
Pulse energy stability (StdDev) 4) < 2 %
Laser pulse repetition rate (PRRL ) range 5)1 – 5 MHz
Pulse repetition rate after pulse pickerPRR = PRRL / N, N=1, 2, 3, … , min 10 kHz
External pulse gatingvia TTL input
Burst mode 6)1 – 10 pulses
Max burst energy
    at 1030 nm> 10 μJ
    at 515 nm> 5 μJ
Burst shape controlvia analog input
Power attenuation0 – 100 % from remote control application or via analog input
Polarization orientationlinear, vertical
Polarization extinction ratio> 1000 : 1
M2< 1.2
Beam divergence (full angle)<1.0 mrad
Beam pointing stability (pk-to-pk) 7)< 30 µrad
Beam diameter (1/e2) at 20 cm distance from laser aperture
    at 1030 nm2.0 ± 0.3 mm
    at 515 nm1.0 ± 0.2 mm
OPERATING REQUIREMENTS
Mains requirements100 ... 240 V AC, 5A, single phase 47... 63 Hz
Maximal power consumption< 500 W
Operating ambient temperature15 – 30 °C
Relative humidity10 – 80 % (non-condensing)
Air contamination levelISO 9 (room air) or better
PHYSICAL CHARACTERISTICS
Cooling of the laser headair, passive
Laser head size (L×W×H)
    at 1030 nm464 × 363 × 129 mm
    at 515 nm620 × 363 × 129 mm
Power supply unit size (L×W×H)449 × 436 × 140 mm (stand-alone)
or 483 × 436 × 140 mm (19" rack mountable)
Umbilical length5 m
CLASSIFICATION
Classification according EN60825-1CLASS 4 laser product
  1. Due to continuous improvement, all specifications are subject to change without notice. Parameters marked typical are not specifications. They are indications of typical performance and will vary with each unit we manufacture.
  2. See typical power and energy curves for other pulse repetition rates
  3. At 1 MHz PRRL during 24 h of operation after warm-up under constant environmental conditions.
  4. At 1 MHz PRRL under constant environmental conditions.
  5. When pulse picker is set to transmit every pulse.
  6. Pulse separation inside the burst is about 20 ns.
  7. Beam pointing stability is evaluated as a movement of the beam centroid in the focal plane of a focusing element.

Note: It is recommended to use clean air generator with FemtoLux 3-GR in order to ensure it‘s performance stability.

Performance

Drawings

Publications

Found total :
2 articles, 2 selected
Application selected :
All Applications
All Applications
Laser Spectroscopy
SHG – Second harmonic generation (SHG) spectroscopy / microscopy
Biomedical – applications focusing on the biology of human health and disease
Micromachining (Industrial)
Photopolymerization

FemtoLux 3 laser for the rapid wide-field second harmonic generation microscopy

Related applications:  Laser Spectroscopy SHG Biomedical

Authors:  D. Rutkauskas, A. Dementjev

FemtoLux 3 laser was used as an illumination source in the wide-field second harmonic generation (SHG) microscope. Relatively high laser pulse energy at a medium pulse repetition frequency allowed for a faster single image acquisition compared to that using laser-scanning. It was also possible to acquire images of relatively large sample areas, which paved the way for the rapid imaging of macroscopic sample areas with microscopic resolution.

Published: 2020.   Source: Ekspla Application notes. Issue № AN2001IL01.

Photo-polymerization differences by using nanosecond and picosecond laser pulses

Related applications:  Photopolymerization Micromachining (Industrial)

Authors:  E. Stankevičius, E. Daugnoraitė, A. Selskis, S. Juodkazis, G. Račiukaitis

Formation of polymeric pillars by using laser interference lithography is compared for nanosecond and picosecond laser pulses. The experimental results are explained by dynamics of laser-excited radicals. The shape of fabricated structures demonstrates that thermal accumulation and oxygen diffusion from the surrounding air make an influence on polymerization when the pulse duration is in the nanosecond range. By using picosecond laser pulses, the thermal accumulation and oxygen diffusion effects are not important for low repetition rate (500 Hz), and they become relevant only at the repetition rates higher than ≥ 1 kHz. It is shown that thermal accumulation is caused by a low-temperature diffusivity and heat accumulation at the polymer-glass interface, and it plays a significant role in the final shape of the structures fabricated using the nanosecond laser pulses.

Published: 2017.   Source: Optics Express, 25(5) 4819- 4830 (2017)

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