FemtoLux 3

Microjoule Class Industrial Grade Femtosecond Fiber Laser
  • Up to 3 W at 1030 nm
  • Up to 3 µJ/pulse
  • 300 fs – 5 ps pulses
  • Single shot – 5 MHz pulse repetition rates
  • Burst shape active control
  • Up to 3 W at 1030 nm
  • Up to 3 µJ/pulse
  • 300 fs – 5 ps pulses
  • Single shot – 5 MHz pulse repetition rates
  • Burst shape active control

Features & Applications


  • Output power 3 W at 1030 nm
  • 300 fs … 5 ps tunable pulse duration
  • Up to 3 μJ/pulse and 10 μJ/burst (at 1030 nm)
  • Excellent beam quality M² < 1.2
  • Individual pulse control
  • Burst shape control
  • Passive cooling (convective) of laser head
  • 24/7 operation


  • Marking and structuring
  • Volume modification of transparent materials
  • Micromachining of brittle materials
  • Photopolymerization
  • Ophthalmologic surgery
  • Biological Imaging
  • Pumping femtosecond OPO/OPA
  • Multiphoton microscopy
  • Second harmonic generation imaging


FemtoLux 3 is a modern femtosecond fiber laser aimed for both R&D use and industrial integration. Laser delivers up to 3 W of average power and up to 3 μJ femtosecond pulse energy. FemtoLux 3 is a flexible platform which allows to optimize output parameters for the desired process. The repetition rate as well as the output power can be easily changed with integrated pulse picker.

With burst mode enabled FemtoLux 3 can generate bursts of pulses with energy above 10 μJ with burst shape controlled in real time via analog input. Pulse duration can also be tuned from 300 fs up to 5 ps. Having laser control application running on a wireless tablet, makes FemtoLux series
lasers a most technologically advanced and user friendly as never before for any type of user, be it researcher or industrial user.


ModelFemtoLux 3
Central wavelength1030 ± 2 nm
Minimal pulse duration (FWHM)< 300 fs
Pulse duration tuning range300 fs … 5 ps
Maximal average output power 2)> 3 W
Power long term stability (StdDev) 3)≤ 0.5 %
Maximal pulse energy 2)3 μJ
Pulse energy stability (StdDev) 4) < 2 %
Laser pulse repetition rate (PRRL ) range 5)1 – 5 MHz
Pulse repetition rate after pulse picker 5)PRR = PRRL / N, N=1, 2, 3, … , min 10 kHz
External pulse gatingvia TTL input
Burst mode 6)1 – 10 pulses
Max burst energy 10 μJ
Burst shape controlvia analog input
Power attenuation0 – 100 % by software or via analog input
Polarization orientationlinear, vertical
Polarization extinction ratio> 1000 : 1
M2< 1.2
Beam divergence (full angle)<1.0 mrad
Beam pointing stability (pk-to-pk) 7)< 30 µrad
Beam diameter (1/e2) at 20 cm distance from laser aperture2.0 ± 0.3 mm
Mains requirements100 ... 240 V AC, 5A, single phase 47... 63 Hz
Maximal power consumption< 500 W
Operating ambient temperature15 – 30 °C
Relative humidity10 – 80 % (non-condensing)
Air contamination levelISO 9 (room air) or better
Coolingair, passive
Laser head size (L×W×H)464 × 363 × 129 mm
Power supply unit size (L×W×H)449 × 436 × 140 mm (stand-alone)
or 483 × 436 × 140 mm (19" rack mountable)
Umbilical length5 m
Classification according EN60825-1CLASS 4 laser product
  1. Due to continuous improvement, all specifications are subject to change without notice.
  2. See typical power and energy curves for other pulse repetition rates.
  3. At 1 MHz PRRL during 24 h of operation after warm-up under constant environmental conditions.
  4. At 1 MHz PRRL under constant environmental conditions.
  5. When pulse picker is set to transmit every pulse.
  6. Time interval between the pulses is about 20 ns.
  7. Beam pointing stability is evaluated as a movement of the beam centroid in the focal plane of a focusing element.




Found total :
1 article, 1 selected
Application selected :
All Applications
All Applications
Micromachining (Industrial)

Photo-polymerization differences by using nanosecond and picosecond laser pulses

Related applications:  Photopolymerization Micromachining (Industrial)

Authors:  E. Stankevičius, E. Daugnoraitė, A. Selskis, S. Juodkazis, G. Račiukaitis

Formation of polymeric pillars by using laser interference lithography is compared for nanosecond and picosecond laser pulses. The experimental results are explained by dynamics of laser-excited radicals. The shape of fabricated structures demonstrates that thermal accumulation and oxygen diffusion from the surrounding air make an influence on polymerization when the pulse duration is in the nanosecond range. By using picosecond laser pulses, the thermal accumulation and oxygen diffusion effects are not important for low repetition rate (500 Hz), and they become relevant only at the repetition rates higher than ≥ 1 kHz. It is shown that thermal accumulation is caused by a low-temperature diffusivity and heat accumulation at the polymer-glass interface, and it plays a significant role in the final shape of the structures fabricated using the nanosecond laser pulses.

Published: 2017.   Source: Optics Express, 25(5) 4819- 4830 (2017)

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