Other materials
Compared to traditional methods, femtosecond lasers with their very short pulse durations offer superior precision. Complex 3D structures as well as non-conventional shapes can be obtained.
Selective Surface Activation Induced by Laser (SSAIL)
SSAIL is a new technology developed by Center for Physical Sciences and Technology and Akoneer for writing electronic circuits directly onto the dielectric material. This is done by firstly modifying the surface properties with an ultra-short pulse laser first and then initiating selective chemical activation which results in Cu plating. SSAIL technology allows one to write the circuits directly by modifying the surface of dielectric followed by an electroless metal plating. One of the strongpoints of this technology is the achievable width traces of down to 1 um. Also, the SSAIL technology is versatile and can be applied to various dielectric materials: PC/ABS, PMMA, PET, FR-4, Al2O3 ceramic, fused-silica, silicon and many more.