Products High intensity systems NanoFlux HP

NanoFlux HP series

High Power Diode-Pumped Nanosecond Amplifier Systems

NanoFlux series electro-optically Q-switched nanosecond Nd:YAG amplifier systems deliver high energy pulses at high repetition rates.

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NanoFlux HP

Overview Specifications Options Performance Drawings Publications Downloads

Overview

Features

Up to 5 J at 1064 nm output pulse energy
Up to 1 kHz repetition rate
Multi-channel version 2 J per channel at 1064 nm
Pulse durations from 2 ns to 500 ns
Spatial Super-Gaussian beam profile
Low maintenance cost and long diode lifetime
Variable pulse duration and temporal pulse shape control (AWG) option available
Various customization possibilities to tailor for specific application
High efficiency diode pumping chambers
Small laser head footprint and OEM integration upon request
Internal system diagnostics
Thermally induced birefringence compensation for high pulse repetition rates
Integrated vacuum system for image translation for smooth Super-Gaussian beam profile
Burst version available
Optional thermally stabilized second and third harmonics generators
Optional industrial grade, portable laser housing with integrated power supplies and cooling units

Applications

Thomson Scattering
Multi-stage OPCPA pumping
Non-linear optics
Ti:S pumping

Description

NanoFlux series electro-optically Q-switched nanosecond Nd:YAG amplifier systems produce high‑energy pulses at high repetition rates. A diode-pumped Q-switched nanosecond laser, based on proven technology, serves as the system master oscillator. The pulses it produces are further amplified to the high-energy output pulses featuring a Super-Gaussian beam profile. The laser system master oscillator output pulses as short as several nanoseconds, featuring a uniform beam profile and low divergence. Alternatively, customers own seed source can be implemented as master oscillator and amplified to required energy level for further amplification in main power amplifiers. Power amplifiers are a chain of low-maintenance diode-pumped single and double pass amplifiers where pulses are amplified up to the required energy. During amplification, spatial beam shaping is employed in order to get a Super-Gaussian beam shape at the output.

Thermally stabilized angle-tuned harmonic generators assure stable second and third harmonic outputs. High spectral purity of harmonics output radiation is achieved using dichroic mirrors.
System control can be performed in several ways.

Using a laser system control pad, via USB and LAN ports (RS232 as optional), using a personal computer with supplied software for the Windows operating system. To tailor the laser for specific applications or requirements, a number of customization possibilities are available; e.g., an industrial-grade, portable laser housing with integrated power supplies and cooling units; customer’s seed laser integration; multi-channel outputs; burst amplification, and others.

Specifications

Model	NanoFlux N400100	NanoFlux N5k100	NanoFlux N2001k	NanoFlux N2k100-Burst
Main specifications ¹⁾
Output energy
at 1064 nm	400 mJ	5000 mJ	200 mJ	2000 mJ
at 532 nm ^{2) 3)}	260 mJ	3000 mJ	130 mJ	1300 mJ
at 355 nm ²⁾	120 mJ	inquire	60 mJ	600 mJ
Pulse repetition rate	100 Hz	100 Hz	1 kHz	100 Hz
Pulse duration ⁴⁾	5 ± 1 ns	5 ± 1 ns	5 ± 1 ns	Adjustable bursts
Pulse energy stability ⁵⁾
at 1064 nm	≤ 0.5 %	≤ 0.5 %	≤ 0.5 %	≤ 2 %
at 532 nm	≤ 0.8 %	≤ 0.8 %	≤ 0.8 %	≤ 4 %
at 355 nm	≤ 2 %	≤ 2 %	≤ 2 %	–
Long-term power drift ⁶⁾	± 2 %	± 2 %	± 2 %	± 2 %
Beam spatial profile ⁷⁾	Super-Gaussian	Super-Gaussian	Super-Gaussian	Super-Gaussian
Beam diameter ⁸⁾	7 mm	15 mm	7 mm	12 mm
Beam pointing stability ⁹⁾	≤ 30 µrad	≤ 30 µrad	≤ 30 µrad	≤ 30 µrad
Beam divergence	≤ 0.7 mrad	≤ 0.5 mrad	≤ 0.7 mrad	≤ 0.5 mrad
Optical pulse jitter ¹⁰⁾	≤ 0.2 ns	≤ 0.2 ns	≤ 0.2 ns	≤ 0.2 ns
Polarization	linear	linear	linear	linear
Physical characteristics ¹¹⁾
Laser head size (W×L×H mm)	600×1200×300	900×2000×300	600×1200×300	900×1800×300
Power supply size (W×L×H mm)	553×600×830	553×600×1230	553×600×830	553×600×1800
Umbilical length ¹²⁾	2.5 m	2.5 m	2.5 m	2.5 m
Operating requirements ¹³⁾
Power requirements ¹⁴⁾	208, 380 or 400 V AC, three phase, 50/60 Hz	208, 380 or 400 V AC, three phase, 50/60 Hz	208, 380 or 400 V AC, three phase, 50/60 Hz	208, 380 or 400 V AC, three phase, 50/60 Hz
Power consumption ¹⁵⁾	≤ 6 kW	≤ 20 kW	≤ 10 kW	≤ 10 kW
Water supply ¹⁵⁾	≤ 8 l/min, 2 Bar, max 20 °C	≤ 20 l/min, 2 Bar, max 20 °C	≤ 12 l/min, 2 Bar, max 20 °C	≤ 12 l/min, 2 Bar, max 20 °C
Operating ambient temperature	22 ± 2 °C	22 ± 2 °C	22 ± 2 °C	22 ± 2 °C
Storage ambient temperature	15 – 35 °C	15 – 35 °C	15 – 35 °C	15 – 35 °C
Relative humidity (non-condensing)	≤ 80 %	≤ 80 %	≤ 80 %	≤ 80 %
Cleanness of the room	ISO Class 7	ISO Class 7	ISO Class 7	ISO Class 7

Model	NanoFlux N400100	NanoFlux N5k100	NanoFlux N2001k	NanoFlux N2k100-Burst

Due to continuous improvement, all specifications are subject to change without notice. The parameters marked ‘typical’ are typical performance and vary with each unit we manufacture. These parameters can be customized to meet customers’ requirements. All parameters measured at 1064 nm if not stated otherwise.
Harmonic outputs are optional. Specifications are valid with the respective harmonic module purchased. Outputs are not simultaneous.
Second harmonic specification is valid when only the SH option is ordered. If TH/FH options are ordered, second harmonic efficiency is reduced to ~50%.
Standard pulse duration is 5 ns. Other pulse durations can be ordered within the range of 0.2 – 500 ns. Output energy differs depending on duration.
Under stable environmental conditions, normalized to average pulse energy (RMS, averaged from 60 s). Energy stability in burst mode depends on the temporal burst shape.
Measured after 30 min warm-up when the ambient temperature variation is less than ±2 °C during 8 hours.
Super-Gaussian spatial mode of 6 – 11th order in near field.
Beam diameter is measured at the laser output at the 1/e2 level for Gaussian beams and the FWHM level for Super-Gaussian beams.
Beam pointing stability is measured as the beam centroid movement in the focal plane of a focusing lens (RMS, averaged from 60 s).
Optical pulse jitter with respect to electrical synchronization pulse outputs: Trig out > 3.5 V @ 50 Ω.
System sizes are preliminary and depend on the customer’s lab layout and options ordered.
Longer umbilical with up to 5 m available upon request.
The laser and auxiliary units must be settled in a place void of dust and aerosols. It is advisable to operate the laser in an air-conditioned room, provided that the laser is placed at a distance from air conditioning outlets. The laser should be positioned on a solid worktable. Access from one side should be ensured.
Voltage fluctuations allowed are +10 % / -15 % from the nominal value.
Power consumption and water supply requirements deviate depending on system configuration.

Note: The laser must be connected to the mains electricity at all times. If there will be no mains electricity for longer than 1 hour, then the laser (system) needs warm up for a few hours before switching on.

Ordering information

Options

Option	Description	Comment
– AWG	Arbitrary waveform generator	Temporal pulse shape control in 1 – 50 ns range by 125 ps step
– AW	Water-air cooling option	Replaces or supplements Water-to-Water cooling unit. Heat dissipation equals total power consumption
– External vacuum supply	External vacuum pump and tubing
– Multiple channel option	Multiple outputs of same or different wavelength/energy	Up to 8 channels
– G	Gaussian like spatial beam profile	Reduces the output energy of fundamental by ~80 %

Option	Description	Comment

Power supply

Cabinet	Usable height	Height H,mm	Width W, mm	Depth D, mm
MR-9	9 U	455.5 (519 ¹⁾ )	553	600
MR-12	12 U	589 (653 ¹⁾ )	553	600
MR-16	16 U	768 (832 ¹⁾ )	553	600
MR-20	20 U	889 (952 ¹⁾ )	553	600
MR-25	25 U	1167 (1231 ¹⁾ )	553	600

Cabinet	Usable height	Height H,mm	Width W, mm	Depth D, mm

Full height with wheels.

Performance

Typical NanoFlux HP system near field beam profile at 1064 nm.

Typical NanoFlux HP system near field beam profile at 532 nm.

Typical NanoFlux HP system near field beam profile with Gaussian beam profile option.

Typical long-term energy stability of NanoFlux HP system.

Drawings

Typical external view of NanoFlux HP series laser system.

Actual design might vary.

An example of NanoFlux HP system external dimensions.

Typical NanoFlux HP laser system power supply dimensions.

MR rack used depends on the laser model.

Publications

Characterization and calibration of the Thomson scattering diagnostic suite for the C-2W field-reversed configuration experiment

A. Ottaviano, T. M. Schindler, K. Zhai, E. Parke, E. Granstedt, M. C. Thompson et al., Review of Scientific Instruments 89 (10), 10C120 (2018). DOI: 10.1063/1.5037101.

High Intensity Sources Thomson Scattering NanoFlux HP

Thomson scattering systems on C-2W field-reversed configuration plasma experiment

K. Zhai, T. Schindler, A. Ottaviano, H. Zhang, D. Fallah, J. Wells et al., Review of Scientific Instruments 89 (10), 10C118 (2018). DOI: 10.1063/1.5037327.