NanoFLux MM series

Multimode (MM) High Energy Q-switched Nd:YAG Lasers

High energy NanoFLux MM series lasers are designed to produce high energy nanosecond pulses at 1064 nm. High pulse energy, excellent pulse-to-pulse energy stability, superior beam quality makes these systems well suited for applications like OPO or Ti: Sapphire pumping, material processing and plasma diagnostics and others.

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NanoFLux MM
Overview

Features

  • High energy nanosecond lasers
  • Up to 10 J pulse energies
  • 5 ns pulse duration
  • Up to 20 ns pulse duration options available
  • 10 or 20 Hz pulse repetition rate
  • Better than 0.5% RMS pulse energy stability
  • Up to 90 M2 version available
  • High efficiency pump chambers and advanced beam shaping for maximum pulse energy extraction
  • Relay imaging between amplifier stages for smooth beam profile at the laser output
  • Thermally induced birefringence compensated
  • Optional temperature stabilized second, third, fourth and fifth harmonic generators
  • Low jitter internal/external synchronization
  • Robust and stable laser head
  • Control through keypad, USB and LAN interfaces with supplied Windows control software (RS232 as optional)

Applications

  • OPO, Ti: Sapphire, dye laser pumping
  • Material processing
  • Plasma generation and diagnostics
  • Nonlinear spectroscopy
  • Remote sensing

Description

High energy NanoFLux MM series lasers are designed to produce high energy nanosecond pulses at 1064 nm. High pulse energy, excellent pulse-to-pulse energy stability, superior beam quality makes these systems well suited for applications like OPO or Ti: Sapphire pumping, material processing and plasma diagnostics and others.

NanoFLux MM series Q-switched oscillators are designed as extremely reliable and stable nanosecond seeding sources producing hundreds mJ pulses from a compact sized body. Simple access to critical compartments of the oscillator allows for easy maintenance. The higher M2 version uses a pro-longed oscillator design that allows a much higher number of modes to oscillate which results in M2 value up to 90. In this case the beam profile becomes very homogenous and flat which can be useful in a number of applications.

NanoFLux series linear amplifiers are cost effective solution for high energy nanosecond systems. Advanced beam shaping ensures smooth, without hot spots beam spatial profile at the laser output. Low light depolarization level allows high efficiency generation of up to 4th harmonic with optional build-in harmonic generators. The simple and field proven design ensures easy maintenance and reliable long-term operation of the NanoFLux MM series laser.

Angle-tuned non-linear crystals harmonic generators mounted in temperature stabilized heaters are used for second, third and fourth harmonic generation. Harmonic separation system is designed to ensure high spectral purity of radiation and direct it to the output ports. Harmonic generators can be integrated into laser head or placed outside laser head into auxiliary harmonic generator module. Output wavelength switching is done manually. Motorized wavelength switching is available by request.

Triggering of the laser is possible from built-in internal or external pulse generator. Pulses with TTL levels are required for external triggering. Laser pulses have less than 0.5 ns RMS jitter with respect to Q-switch triggering pulse in both cases.

System control is available through control pad, USB and LAN interfaces (RS232 as optional). The system can be controlled from personal computer with supplied software for Windows operating system.

Specifications

ModelNanoFLux N3k10NanoFLux N5k10NanoFLux N7k10NanoFLux N10k10
Main specifications 1)
Output energy
at 1064 nm3000 mJ5000 mJ7000 mJ10000 mJ
at 532 nm 2) 3)1500 mJ2500 mJ3500 mJ5000 mJ
at 355 nm 2)1000 mJ1300 mJ1700 mJ2000 mJ
at 266 nm 2)270 mJ400 mJ500 mJ700 mJ
Pulse repetition rate10 Hz10 Hz10 Hz10 Hz
Pulse duration 4)5 ± 1 ns5 ± 1 ns5 ± 1 ns5 ± 1 ns
Pulse energy stability 5)
at 1064 nm≤ 0.5 %≤ 0.5 %≤ 0.5 %≤ 0.5 %
at 532 nm≤ 1 %≤ 1 %≤ 1 %≤ 1 %
at 355 nm≤ 2 %≤ 2 %≤ 2 %≤ 2 %
at 266 nm≤ 3 %≤ 3 %≤ 3 %≤ 3 %
Long-term power drift 6)± 2 %± 2 %± 2 %± 2 %
Beam spatial profile 7)Super-GaussianSuper-GaussianSuper-GaussianSuper-Gaussian
M2 8)~5~5~5~5
Beam diameter 9)~ 18 mm~ 18 mm~ 25 mm~ 25 mm
Beam pointing stability 10)≤ 50 µrad≤ 50 µrad≤ 50 µrad≤ 50 µrad
Beam divergence≤ 0.5 mrad≤ 0.5 mrad≤ 0.5 mrad≤ 0.5 mrad
Optical pulse jitter 11)≤ 0.5 ns≤ 0.5 ns≤ 0.5 ns≤ 0.5 ns
Linewidth≤ 1 cm‑1≤ 1 cm‑1≤ 1 cm‑1≤ 1 cm‑1
Polarizationlinearlinearlinearlinear
Physical characteristics 12)
Laser head size (W×L×H mm)460 × 1250 × 260500 × 1300 × 300600 × 1800 × 300700 × 2000 × 300
Power supply size (W×L×H mm)550 × 600 × 1250550 × 600 × 1250550 × 600 × 1250550 × 600 × 1640
Umbilical length 13)5 m5 m5 m5 m
Operating requirements 14)
Power requirements 15)208, 380 or 400 V AC,
three phase, 50/60 Hz
208, 380 or 400 V AC,
three phase, 50/60 Hz
208, 380 or 400 V AC,
three phase, 50/60 Hz
208, 380 or 400 V AC,
three phase, 50/60 Hz
Power consumption 16)≤ 5 kVA≤ 6 kVA≤ 7 kVA≤ 8 kVA
Water supply 16)≤ 5 l/min, 2 Bar, max 15 °C≤ 5 l/min, 2 Bar, max 15 °C≤ 12 l/min, 2 Bar, max 15 °C≤ 12 l/min, 2 Bar, max 15 °C
Operating ambient temperature22 ± 2 °C22 ± 2 °C22 ± 2 °C22 ± 2 °C
Storage ambient temperature15 – 35 °C15 – 35 °C15 – 35 °C15 – 35 °C
Relative humidity (non-condensing)≤ 80 %≤ 80 %≤ 80 %≤ 80 %
Cleanness of the roomISO Class 7ISO Class 7ISO Class 7ISO Class 7
ModelNanoFLux N3k10NanoFLux N5k10NanoFLux N7k10NanoFLux N10k10
  1. Due to continuous improvement, all specifications are subject to change without notice. The parameters marked ‘typical’ are indications of typical performance and will vary with each unit we manufacture. Presented parameters can be customized to meet customer‘s requirements. All parameters measured at 1064 nm if not stated otherwise.
  2. Harmonic outputs are optional. Specifications valid with respective harmonic module purchased. Outputs are not simultaneous.
  3. Second harmonic is available with LBO crystal then the conversion efficiency is increased to 70%. If TH/FH options are orders second harmonic efficiency is reduced to ~50%.
  4. Standard pulse duration is 5 ns. Other pulse durations can be ordered within range of 10 – 20 s. Output energy might differ depending on duration.
  5. Under stable environmental conditions, normalized to average pulse energy (RMS, averaged from 60 s).
  6. Measured over 8 hours period after 30 min warm-up when ambient temperature variation is less than ±2 °C.
  7. Super-Gaussian spatial mode of 6-11th order in near field.
  8. M2 value of ~5 is standard. Versions with M2 in the range of 20 – 90 can be ordered.
  9. Beam diameter is measured at signal output at 1/e2 level for Gaussian beams and FWHM level for Super-Gaussian beams.
  10. Beam pointing stability is evaluated as movement of the beam centroid in the focal plane of a focusing element (RMS, averaged from 60 s).
  11. Optical pulse jitter with respect to electrical outputs: Trig out > 3.5 V @ 50 Ω.
  12. System sizes are preliminary and depend on customer lab layout and additional options purchased.
  13. Longer umbilical with up to 10 m available upon request.
  14. The laser and auxiliary units must be settled in such a place void of dust and aerosols. It is advisable to operate the laser in air conditioned room, provided that the laser is placed at a distance from air conditioning outlets. The laser should be positioned on a solid worktable. Access from one side should be ensured.
  15. Voltage fluctuations allowed are +10 % / -15 % from nominal value.
  16. Power consumption and water supply requirements deviate depending on system configuration.

Note: Laser must be connected to the mains electricity all the time. If there will be no mains electricity for longer that 1 hour then laser (system) needs warm up for a few hours before switching on.

Ordering information of NanoFlux MM lasers.

Ordering information of NanoFlux MM lasers.

Options

OptionDescriptionComment
– GProvides a Gaussian-like beam profilePulse energies are typically lower in comparison to standard version by 80 %
– M20…90Provides a flat, smooth beam profile, without hot spots and diffraction rings in the near and medium fieldM² > 20 or M² > 90
– RLIOptional Relay Imaging for smooth beam profile
– AWWater-air cooling optionReplaces or supplements Water-to-Water cooling unit. Heat dissipation equals total power consumption
– N10…N2010 – 20 ns pulse durationIn the range of 2 – 25 ns
OptionDescriptionComment

Power supply

CabinetUsable heightHeight H,mmWidth W, mmDepth D, mm
MR-99 U455.5 (519 1) )553600
MR-1212 U589 (653 1) )553600
MR-1616 U768 (832 1) )553600
MR-2020 U889 (952 1) )553600
MR-2525 U1167 (1231 1) )553600
CabinetUsable heightHeight H,mmWidth W, mmDepth D, mm
  1. Full height with wheels.

Publications

Conversion efficiency of a laser-plasma source based on a Xe jet in the vicinity of a wavelength of 11 nm

N. I. Chkhalo, S. A. Garakhin, A. Y. Lopatin, A. N. Nechay, A. E. Pestov, V. N. Polkovnikov et al., AIP Advances 8 (10), 105003 (2018). DOI: 10.1063/1.5048288.

Development and characterization of a laser-plasma soft X-ray source for contact microscopy

M. G. Ayele, P. W. Wachulak, J. Czwartos, D. Adjei, A. Bartnik,  Wegrzynski et al., Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 411, 35-43 (2017). DOI: 10.1016/j.nimb.2017.03.082.

XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets

E. F. Barte, R. Lokasani, J. Proska, L. Stolcova, O. Maguire, D. Kos et al., in X-ray Lasers and Coherent X-ray Sources: Development and Applications, A. Klisnick, and C. S. Menoni, eds. (SPIE, 2017), pp. 1024315. DOI: 10.1117/12.2265984.

EUV spectra from highly charged terbium ions in optically thin and thick plasmas

C. Suzuki, F. Koike, I. Murakami, N. Tamura, S. Sudo, E. Long et al., Journal of Physics: Conference Series 583 (1), 012007 (2015). DOI: 10.1088/1742-6596/583/1/012007.

Enhancement of Laser-Induced Breakdown Spectroscopy (LIBS) Detection Limit Using a Low-Pressure and Short-Pulse Laser-Induced Plasma Process

Z. Z. Wang, Y. Deguchi, M. Kuwahara, J. J. Yan, and J. P. Liu, Applied Spectroscopy 67 (11), 1242-1251 (2013). DOI: 10.1366/13-07131.

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