SL230 series

SBS Compressed Picosecond DPSS Nd:YAG Lasers
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  • High brightness picosecond Nd:YAG Lasers
  • Up to 500 mJ
  • Tunable pulse duration option (120 – 1500 ps)
  • Diode pumped stable oscillator
  • High brightness picosecond Nd:YAG Lasers
  • Up to 500 mJ
  • Tunable pulse duration option (120 – 1500 ps)
  • Diode pumped stable oscillator

Features & Applications

Features

  • Diode pumped Q-switched SLM master oscillator
  • Flashlamp pumped power amplifier for up to 500 mJ pulse energy at 1064 nm
  • Advanced SBS compression produces pulses down to 120 ps duration
  • Excellent pre-pulse contrast ratio
  • Thermo stabilized second, third or fourth harmonic generator options
  • Low jitter external triggering
  • Sync pulses output with <200 ps rms jitter
  • Laser control from PC via USB or RS232 port
  • Low maintenance costs

Applications

  • Plasma research
  • Medical
  • Material ablation and deposition
  • Interferometry
  • Remote laser sensing
  • Satellite ranging

Description

SL230 series lasers are excellent solution for applications, where high energy picosecond pulses are needed. Not like conventional mode-locked lasers that typically uses saturable nonlinear absorption or Kerr lensing to produce ultrafast pulses, the SL230 series lasers employ backward-stimulated Brillouin scattering (SBS) in liquid for the same purpose.

Innovative design

Diode pumped electro-optically Q-switched single longitudinal mode (SLM) nanosecond generator is the heart of the system. It provides nanosecond optical pulse that is later compressed during SBS in a special cell.

Q-switched master oscillator allows precise external triggering with jitter of less than 0.2 ns rms while mode-locked lasers typically have jitters of at least of tens of nanoseconds or even worse. Precise sync pulses from internal delay generator are also available with less than 200 ps rms jitter with respect to optical pulse.

Pulse compression is done in SBS‑cell. The geometry of interaction is designed to produce shortest and most stable pulses with 120 ps duration.

After SBS compression, pulse is directed to multi-pass flashlamp pumped power amplifier for amplification to up to 500 mJ pulse energy. Completely diode pumped version of SL231 is available under special request.

Thermocontrolled harmonic generators, based on angle-tuned KD*P and KDP crystals and harmonic separation optics are available as standard options. Each wavelength has a separate output port.

Build in energy monitors continuously monitors output pulse energy. Data from the energy monitor can be seen on the remote keypad or on PC screen. Power supply and cooling units are mounted into standard 19” rack.

Simple and convenient laser control

Laser is controlled by PC via USB port with application for Windows™ operating system. In addition, major settings of laser can be controlled through remote control pad. The remote pad features a backlit display that is easy to read even while wearing laser safety eyewear.

Specifications

 Model SL231 2)SL234SL235
MAIN SPECIFICATIONS 1)
Max. pulse energy
    at 1064 nm20 mJ250 mJ500 mJ
    at 532 nm 3)8 mJ125 mJ240 mJ
    at 355 nm 4)5 mJ70 mJ140 mJ
    at 266 nm 5)2 mJ40 mJ80 mJ
    at 213 nm 6)inquire
Pulse energy stability (StdDev) 7)
    at 1064 nm2 %1.5 %
    at 532 nm3.5 %3 %
    at 355 nm5 %4 %
    at 266 nm8 %7 %
    at 213 nminquire
Pulse duration at 1064 nm (FWHM) 8)120 ps ± 15 %150 ps ± 15 %
Pulse duration stability at 1064 nm (StdDev) 7)5 %
Repetition rate50 Hz10 Hz5 Hz
Linewidth≤ 0.2 cm-1
Polarization ratio at 1064 nm>1:100
Optical pulse jitter (StdDev) 9)0.2 ns
Beam profilenear GaussianHat-Top 10)
Beam pointing stability at 1064 nm 11)<50 µrad
Beam divergence 12)<0.5 mrad
Beam height170 ± 5 mm
Contrast ratio≥105 : 1
Beam diameter 13)~4 mm~10 mm~12 mm
PHYSICAL CHARACTERISTICS
Laser head size (W × L × H)456 × 810 × 249 mm456 × 1031 × 249 mm
Electric cabinet size (W × L × H)553 × 600 × 519 mm553 × 600 × 665 mm
Umbilical length2.5 m
OPERATING REQUIREMENTS
Water consumption (max 20 °C)<10 liters/min
Room temperature18 – 24 °C
Relative humidity10 – 80 % (non-condensing)
Power requirements208 or 380 V AC, three phase, 50/60 Hz208 or 230 V AC, single phase, 50/60 Hz
Power consumption <2 kVA<3.5 kVA<4 kVA
  1. Due to continuous improvement, all specifications are subject to change. Parameters marked typical are illustrative. They are indications of typical performance and will vary with each unit we manufacture. Unless stated otherwise all specifications are measured at 1064 nm and for basic system without options.
  2. Completely diode pumped version of SL231 is available under special request.
  3. For -SH option. Outputs are not simultaneous. Please inquire for pulse energies at other wavelengths.
  4. For -TH option. Outputs are not simultaneous. Please inquire for pulse energies at other wavelengths.
  5. For -FH option. Outputs are not simultaneous. Please inquire for pulse energies at other wavelengths.
  6. For custom -FiH option. Outputs are not simultaneous. Please inquire for pulse energies at other wavelengths.
  7. Averaged from 300 pulses.
  8. Inquire for optional variable pulse durations in 150 – 400 ps or 400 – 1000 ps range (does not apply for SL231). Some of laser specifications with this option may differ from those without it.
  9. In external triggering mode with two separate triggering pulses for flashlamps and Q-switch.
  10. Near Gaussian fit profile with lower energy is available by request.
  11. RMS value measured from 300 shots. Beam pointing stability is evaluated from fluctuations of beam centroid position in the far field.
  12. Full angle measured at the 1/e² point at 1064 nm.
  13. Beam diameter is measured at 1064 nm at the 1/e² level.

Note: Laser must be connected to the mains electricity all the time. If there will be no mains electricity for longer that 1 hour then laser (system) needs warm up for a few hours before switching on.

Options

Variable pulse duration options -VPx and -VPCx

SL series lasers offer a unique capability for tuning pulse duration. The tuning is done by changing the geometry of interaction in the SBS compressor. Two tuning ranges – 120 – 500 ps (option -VP1) and 500 – 1000 ps (option -VP2) – are available as standard options.

While the -VPx option requires manual tuning of optical layout components for pulse duration change, the -VPCx option provides motorized tuning that allows a change in pulse duration from a personal computer (purchased separately) or laser control pad.

Note. Certain specifications may change when the laser is configured for variable pulse duration. Contact Ekspla for detailed data sheets.

Drawings

Publications

Found total :
6 articles, 6 selected
Application selected :
All Applications
All Applications
Scientific Applications
High Intensity Sources – laser produced plasma, x-ray source
Laser Induced Plasma
Laser Spectroscopy
LIBS – laser induced breakdown spectroscopy

Development and characterization of a laser-plasma soft X-ray source for contact microscopy

Related applications:  High Intensity Sources

Authors:  M.G. Ayele, P.W. Wachulak, J. Czwartos, D. Adjei, A. Bartnik, Ł. Wegrzynski, M. Szczurek, L. Pina, H. Fiedorowicz

In this work, we present a compact laser-produced plasma source of X-rays, developed and characterized for application in soft X-ray contact microscopy (SXCM). The source is based on a double stream gas puff target, irradiated with a commercially available Nd:YAG laser, delivering pulses with energy up to 740 mJ and 4 ns pulse duration at 10 Hz repetition rate. The target is formed by pulsed injection of a stream of high-Z gas (argon) into a cloud of low Z-gas (helium) by using an electromagnetic valve with a double nozzle setup. The source is designed to irradiate specimens, both in vacuum and in helium atmosphere with nanosecond pulses of soft X-rays in the ‘‘water-window” spectral range. The source is capable of delivering a photon fluence of about 1.09 x 103 photon/µm2/pulse at a sample placed in vacuum at a distance of about 20 mm downstream the source. It can also deliver a photon fluence of about 9.31 x 102 - photons/µm2/pulse at a sample placed in a helium atmosphere at the same position. The source design and results of the characterization measurements as well as the optimization of the source are presented and discussed. The source was successfully applied in the preliminary experiments on soft X-ray contact microscopy and images of microstructures and biological specimens with ~80 nm half-pitch spatial resolution, obtained in helium atmosphere, are presented.

Published: 2017.   Source: Nuclear Instruments and Methods in Physics Research B 411 (2017) 35–43

EUV spectra from highly charged terbium ions in optically thin and thick plasmas

Related applications:  High Intensity Sources

Authors:  C Suzuki, F Koike, I Murakami, N Tamura, S Sudo, E Long, J Sheil, E White, F O'Reilly, E Sokell, P Dunne, G O'Sullivan

We have observed extreme ultraviolet (EUV) spectra from terbium (Tb) ions in optically thin and thick plasmas for a comparative study. The experimental spectra are recorded in optically thin, magnetically conned torus plasmas and dense laser-produced plasmas (LPPs). The main feature of the spectra is quasicontinuum emission with a peak around 6.5-6.6 nm, the bandwidth of which is narrower in the torus plasmas than in the LPPs. A comparison between the two types of spectra also suggests strong opacity effects in the LPPs. A comparison with the calculated line strength distributions gives a qualitative interpretation of the observed spectra.

Published: 2015.   Source: Journal of Physics: Conference Series 583 (2015) 012007 (2015)

XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets

Related applications:  High Intensity Sources

Authors:  E. F. Barte, R. Lokasani, J. Proska, L. Stolcova, O. Maguire, D. Kos, P. Sheridan, F. O’Reilly, E. Sokell, T. McCormack, G. O’Sullivan, P. Dunne, J. Limpouch

Laser-produced plasmas are intense sources of XUV radiation that can be suitable for different applications such as extreme ultraviolet lithography, beyond extreme ultraviolet lithography and water window imaging. In particular, much work has focused on the use of tin plasmas for extreme ultraviolet lithography at 13.5 nm. We have investigated the spectral behavior of the laser produced plasmas formed on closely packed polystyrene microspheres and porous alumina targets covered by a thin tin layer in the spectral region from 2.5 to 16 nm. Nd:YAG lasers delivering pulses of 170 ps (Ekspla SL312P )and 7 ns (Continuum Surelite) duration were focused onto the nanostructured targets coated with tin. The intensity dependence of the recorded spectra was studied; the conversion efficiency (CE) of laser energy into the emission in the 13.5 nm spectral region was estimated. We have observed an increase in CE using high intensity 170 ps Nd:YAG laser pulses as compared with a 7 ns pulse.

Published: 2017.   Source: SPIE 10243, X-ray Lasers and Coherent X-ray Sources: Development and Applications, 1024315 (2017);

Conversion efficiency of a laser-plasma source based on a Xe jet in the vicinity of a wavelength of 11 nm

Related applications:  High Intensity Sources

Authors:  N. I. Chkhalo, S. A. Garakhin, A. Ya. Lopatin, A. N. Nechay, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, N. N. Tsybin, S. Yu. Zuev

We optimized the parameters of a laser-produced plasma source based on a solid-state Nd: YAG laser (λ = 1.06 nm, pulse duration 4 ns, energy per pulse up to 500 mJ, repetition rate 10 Hz, lens focus distance 45 mm, maximum power density of laser radiation in focus 9 x 1011 W/cm2) and a double-stream Xe/He gas jet to obtain a maximum of radiation intensity around 11 nm wavelength. It was shown that the key factor determining the ionization composition of the plasma is the jet density.With the decreased density, the ionization composition shifts toward a smaller degree of ionization, which leads to an increase in emission peak intensity around 11 nm.We attribute the dominant spectral feature centred near 11 nm originating from an unidentified 4d-4f transition array in Xe+10...+13 ions. The exact position of the peak and the bandwidth of the emission line were determined. We measured the dependence of the conversion efficiency of laser energy into an EUV in-band energy with a peak at 10.82 nm from the xenon pressure and the distance between the nozzle and the laser focus. The maximum conversion efficiency (CE) into the spectral band of 10–12 nm measured at a distance between the nozzle and the laser beam focus of 0.5 mm was CE = 4.25 ± 0.30%. The conversion efficiencies of the source in-bands of 5 and 12 mirror systems at two wavelengths of 10.8 and 11.2 nm have been evaluated; these efficiencies may be interesting for beyond extreme ultraviolet lithography.

Published: 2018.   Source: AIP Advances 8, 105003 (2018)

Enhancement of Laser-Induced Breakdown Spectroscopy (LIBS) Detection Limit Using a Low-Pressure and Short-Pulse Laser-Induced Plasma Process

Related applications:  LIBS Laser Spectroscopy

Authors:  Z. Zhen Wang, Y. Deguchi, M. Kuwahara, J. Jie Yan, J. Ping Liu

Laser-induced breakdown spectroscopy (LIBS) technology is an appealing technique compared with many other types of elemental analysis because of the fast response, high sensitivity, real-time, and noncontact features. One of the challenging targets of LIBS is the enhancement of the detection limit. In this study, the detection limit of gas-phase LIBS analysis has been improved by controlling the pressure and laser pulse width. In order to verify this method, low-pressure gas plasma was induced using nanosecond and picosecond lasers. The method was applied to the detection of Hg. The emission intensity ratio of the Hg atom to NO (IHg/ INO) was analyzed to evaluate the LIBS detection limit because the NO emission (interference signal) was formed during the plasma generation and cooling process of N2 and O2 in the air. It was demonstrated that the enhancement of IHg/INO arose by decreasing the pressure to a few kilopascals, and the IHg/INO of the picosecond breakdown was always much higher than that of the nanosecond breakdown at low buffer gas pressure. Enhancement of IHg/INO increased more than 10 times at 700 Pa using picosecond laser with 35 ps pulse width. The detection limit was enhanced to 0.03 ppm (parts per million). We also saw that the spectra from the center and edge parts of plasma showed different features. Comparing the central spectra with the edge spectra, IHg/INO of the edge spectra was higher than that of the central spectra using the picosecond laser breakdown process.

Published: 2013.   Source: Applied Spectroscopy 67(11):1242-51

Emission properties of ns and ps laser-induced soft x-ray sources using pulsed gas jets

Related applications:  High Intensity Sources Laser Induced Plasma

Authors:  M. Müller, F.-Ch. Kühl, P. Großmann, P. Vrba, K, Mann

The influcence of the pulse duration on the emission characteristics of nearly debris-free laser-induced plasmas in the soft x-ray region (λ ≈1-5 nm) was investigated, using six different target gases from a pulsed jet. Compared to ns pulses of the same energy, a ps laser generates a smaller, more strongly ionized plasma, being about 10 times brighter than the ns laser plasma. Moreover, the spectra are considerably shifted towards shorter wavelengths. Electron temperatures and densities of the plasma are obtained by comparing the spectra with model calculations using a magneto-hydrodynamic code.

Published: 2013.   Source: Opt. Express 21, 12831-12842 (2013)

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