NL310 series

High Energy Q-switched Nd:YAG Lasers
  • High energy nanosecond lasers
  • 10 J pulse energies
  • 4 – 6 ns pulse duration
  • 10 or 20 Hz pulse repetition rate
  • High energy nanosecond lasers
  • 10 J pulse energies
  • 4 – 6 ns pulse duration
  • 10 or 20 Hz pulse repetition rate

Features & Applications


  • Up to 10 J output energy
  • Better than 0.5% rms pulse energy stability
  • 4 – 6 ns pulse duration
  • 10 or 20 Hz repetition rate
  • Temperature stabilized second, third, fourth and fifth harmonic generators
  • Remote control via keypad  or USB-CAN port
  • Low jitter internal/external synchronization
  • Robust and stable laser head


  • OPO, Ti: Sapphire, dye laser pumping
  • Material processing
  • Plasma generation and diagnostics
  • Nonlinear spectroscopy
  • Remote sensing


High pulse energy NL310 series lasers are targeted for applications like OPO or Ti: Sapphire pumping, material processing and plasma diagnostics. These lasers can produce pulse energies up to 10 J in fundamental wavelength at 10 Hz pulse repetition rate.

For the convenience of customers the NL310 series nanosecond Q-switched laser can be controlled either through a remote keypad or USB-CAN port. The remote keypad allows easy control of all parameters and features a backlit display that is easy to read even wearing laser safety eyewear.

Software for Windows™ operating system is provided to control the laser from PC. LabView™ drivers are supplied as well, allowing laser control integration into existing Labview™ programs.

The optional second (SH, 532 nm), third (TH, 355 nm), fourth (FH, 266 nm) and fifth (FiH, 213 nm) harmonic generators can be integrated into laser head or placed outside laser head into auxiliary harmonic generator module. Output wavelength switching is done manually. Motorized wavelength switching is available by request.
Triggering of the laser is possible from built-in internal or external pulse generator. Pulses with TTL levels are required for external triggering. Laser pulses have less than 0.5 ns rms jitter with respect to Q-switch triggering pulse in both cases.

The simple and field proven design ensures easy maintenance and reliable long-term operation of the NL310 series laser. Optional Relay Imaging for smooth beam profile is available.


Model NL311 NL313 NL314NL315NL317NL319
Pulse energy
    at 1064 nm 1300 mJ 1600 mJ 2000 / 1800 mJ3500 mJ5000 mJ10000 mJ
    at 532 nm 2) 6) 600 mJ 800 mJ 1000 / 900 mJ1700 mJ2500 mJ5000 mJ
    at 355 nm 3) 6) 390 mJ 490 mJ 610 / 600 mJ1000 mJ1300 mJ2000 mJ
    at 266 nm 4) 6) 130 mJ180 / 150 mJ190 / 160 mJ270 mJ400 mJ700 mJ
    at 213 nm 5) 6)25 / 20 mJ30 / 25 mJ40 / 30 mJinquire
Pulse energy stability (StdDev): 7)
    at 1064 nm0.5 %
    at 532 nm1.5 %
    at 355 nm2.5 %
    at 266 nm4.0 %
    at 213 nm6.0 %
Power drift 8)± 2 %
Pulse duration 9)4 – 6 ns4 – 7 ns
Repetition rate10 / 20 Hz10 Hz
Polarizationvertical, > 90 %
Optical pulse jitter 10) < 0.5 ns
Linewidth < 1 cm-1
Beam profile 11)"Hat-Top" (near field), near Gaussian (far field)
Typical beam diameter 12) ~10 mm ~12 mm ~18 mm~21 mm~25 mm
Beam divergence 13) < 0.5 mrad
Beam pointing stability 14)± 50 µrad
Laser head (W × L × H)460 × 1250 × 260 mm310 × 800 × 230 mm /
460 × 1250 × 260 mm
460 × 1250 × 260 mm600 × 1800 × 300 mm
Power supply unit (W × L × H)553 × 600 × 653 mm /
553 × 600 × 832 mm
553 × 600 × 832 mm /
553 × 600 × 1020 mm
550 × 600 × 1250 mm550 × 600 × 1640 mm
Umbilical length 2.5 m
Water consumption (max 20 °C) 15)< 8 / <12 l/min< 12 / <16 l/min< 12 l/min
Ambient temperature 22 ± 2 °C
Relative humidity20 – 80% (non-condensing)
Power requirements 16)208 – 240 VAC, single phase, 50/60 Hz /
208, 380 or 400 V AC, three phases, 50/60 Hz
208, 380 or 400 V AC, three phases, 50/60 Hz
Power consumption< 2 / < 3.5 kVA< 2.5 / < 4 kVA< 4 / < 5 kVA< 5 kVA< 6 kVA< 8 kVA
  1. Due to continuous improvement, all specifi­ca­tions subject to change without notice. Parameters marked typical are not specifications. They are indications of typical perfor­mance and will vary with each unit we manufacture. Unless stated otherwise, all specifications are measured at 1064 nm and for basic system without options.
  2. For -SH harmonic generator option.
  3. For -SH/TH harmonic generator option.
  4. For -SH/FH, -SH/TH/FH or -SH/FH/FiH harmonic generator option.
  5. For -SH/FH/FiH harmonic generator option.
  6. Harmonic outputs are not simultaneous; only single wavelength beam is present at the output at once. Manual reconfiguration is required to switch wavelength.
  7. Averaged from pulses, emitted during 30 sec time interval after 5 – 15 minutes of 
  8. Measured over 8 hours period after 20 min warm-up when ambient temperature variation is less than ±2 °C.
  9. FWHM.
  10. Standard deviation value, measured with respect to Q-switch triggering pulse.
  11. Near field (at the output aperture) TOP HAT fit is >70%.
  12. Beam diameter is measured at 1064 nm at the 1/e² level.
  13. Full angle measured at the 1/e² level at 1064 nm.
  14. Beam pointing stability is evaluated as movement of the beam centroid in the focal plane of a focusing element.
  15. Water air cooling chiller is possible. Inquire for details.
  16. Voltage fluctuations allowed are +10 % / -15 % from nominal value. Mains voltage should be specified when ordering.

Note: Laser must be connected to the mains electricity all the time. If there will be no mains electricity for longer that 1 hour then laser (system) needs warm up for a few hours before switching on.


  • -G option. For models NL311, NL313. Provides beam profile optimized for applications requiring smooth, without hot spots beam profile in the near and medium field. Pulse energies are typically lower in comparison to standard version.
  • Multimode spatial beam profile for smooth envelope. M² > 20.
  • -RLI. Optional Relay Imaging for smooth beam profile.

Performance & Drawings


Found total :
5 articles, 5 selected
Application selected :
All Applications
All Applications
Scientific Applications
High Intensity Sources – laser produced plasma, x-ray source, extreme UV
Laser Spectroscopy
LIBS – laser induced breakdown spectroscopy

Conversion efficiency of a laser-plasma source based on a Xe jet in the vicinity of a wavelength of 11 nm

Related applications:  High Intensity Sources

Authors:  N. I. Chkhalo, S. A. Garakhin, A. Ya. Lopatin, A. N. Nechay, A. E. Pestov, V. N. Polkovnikov, N. N. Salashchenko, N. N. Tsybin, S. Yu. Zuev

We optimized the parameters of a laser-produced plasma source based on a solid-state Nd: YAG laser (λ = 1.06 nm, pulse duration 4 ns, energy per pulse up to 500 mJ, repetition rate 10 Hz, lens focus distance 45 mm, maximum power density of laser radiation in focus 9 x 1011 W/cm2) and a double-stream Xe/He gas jet to obtain a maximum of radiation intensity around 11 nm wavelength. It was shown that the key factor determining the ionization composition of the plasma is the jet density.With the decreased density, the ionization composition shifts toward a smaller degree of ionization, which leads to an increase in emission peak intensity around 11 nm.We attribute the dominant spectral feature centred near 11 nm originating from an unidentified 4d-4f transition array in Xe+10...+13 ions. The exact position of the peak and the bandwidth of the emission line were determined. We measured the dependence of the conversion efficiency of laser energy into an EUV in-band energy with a peak at 10.82 nm from the xenon pressure and the distance between the nozzle and the laser focus. The maximum conversion efficiency (CE) into the spectral band of 10–12 nm measured at a distance between the nozzle and the laser beam focus of 0.5 mm was CE = 4.25 ± 0.30%. The conversion efficiencies of the source in-bands of 5 and 12 mirror systems at two wavelengths of 10.8 and 11.2 nm have been evaluated; these efficiencies may be interesting for beyond extreme ultraviolet lithography.

Published: 2018.   Source: AIP Advances 8, 105003 (2018)

XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets

Related applications:  High Intensity Sources

Authors:  E. F. Barte, R. Lokasani, J. Proska, L. Stolcova, O. Maguire, D. Kos, P. Sheridan, F. O’Reilly, E. Sokell, T. McCormack, G. O’Sullivan, P. Dunne, J. Limpouch

Laser-produced plasmas are intense sources of XUV radiation that can be suitable for different applications such as extreme ultraviolet lithography, beyond extreme ultraviolet lithography and water window imaging. In particular, much work has focused on the use of tin plasmas for extreme ultraviolet lithography at 13.5 nm. We have investigated the spectral behavior of the laser produced plasmas formed on closely packed polystyrene microspheres and porous alumina targets covered by a thin tin layer in the spectral region from 2.5 to 16 nm. Nd:YAG lasers delivering pulses of 170 ps (Ekspla SL312P )and 7 ns (Continuum Surelite) duration were focused onto the nanostructured targets coated with tin. The intensity dependence of the recorded spectra was studied; the conversion efficiency (CE) of laser energy into the emission in the 13.5 nm spectral region was estimated. We have observed an increase in CE using high intensity 170 ps Nd:YAG laser pulses as compared with a 7 ns pulse.

Published: 2017.   Source: SPIE 10243, X-ray Lasers and Coherent X-ray Sources: Development and Applications, 1024315 (2017);

Development and characterization of a laser-plasma soft X-ray source for contact microscopy

Related applications:  High Intensity Sources

Authors:  M.G. Ayele, P.W. Wachulak, J. Czwartos, D. Adjei, A. Bartnik, Ł. Wegrzynski, M. Szczurek, L. Pina, H. Fiedorowicz

In this work, we present a compact laser-produced plasma source of X-rays, developed and characterized for application in soft X-ray contact microscopy (SXCM). The source is based on a double stream gas puff target, irradiated with a commercially available Nd:YAG laser, delivering pulses with energy up to 740 mJ and 4 ns pulse duration at 10 Hz repetition rate. The target is formed by pulsed injection of a stream of high-Z gas (argon) into a cloud of low Z-gas (helium) by using an electromagnetic valve with a double nozzle setup. The source is designed to irradiate specimens, both in vacuum and in helium atmosphere with nanosecond pulses of soft X-rays in the ‘‘water-window” spectral range. The source is capable of delivering a photon fluence of about 1.09 x 103 photon/µm2/pulse at a sample placed in vacuum at a distance of about 20 mm downstream the source. It can also deliver a photon fluence of about 9.31 x 102 - photons/µm2/pulse at a sample placed in a helium atmosphere at the same position. The source design and results of the characterization measurements as well as the optimization of the source are presented and discussed. The source was successfully applied in the preliminary experiments on soft X-ray contact microscopy and images of microstructures and biological specimens with ~80 nm half-pitch spatial resolution, obtained in helium atmosphere, are presented.

Published: 2017.   Source: Nuclear Instruments and Methods in Physics Research B 411 (2017) 35–43

EUV spectra from highly charged terbium ions in optically thin and thick plasmas

Related applications:  High Intensity Sources

Authors:  C Suzuki, F Koike, I Murakami, N Tamura, S Sudo, E Long, J Sheil, E White, F O'Reilly, E Sokell, P Dunne, G O'Sullivan

We have observed extreme ultraviolet (EUV) spectra from terbium (Tb) ions in optically thin and thick plasmas for a comparative study. The experimental spectra are recorded in optically thin, magnetically conned torus plasmas and dense laser-produced plasmas (LPPs). The main feature of the spectra is quasicontinuum emission with a peak around 6.5-6.6 nm, the bandwidth of which is narrower in the torus plasmas than in the LPPs. A comparison between the two types of spectra also suggests strong opacity effects in the LPPs. A comparison with the calculated line strength distributions gives a qualitative interpretation of the observed spectra.

Published: 2015.   Source: Journal of Physics: Conference Series 583 (2015) 012007 (2015)

Enhancement of Laser-Induced Breakdown Spectroscopy (LIBS) Detection Limit Using a Low-Pressure and Short-Pulse Laser-Induced Plasma Process

Related applications:  Laser Spectroscopy LIBS

Authors:  Z. Zhen Wang, Y. Deguchi, M. Kuwahara, J. Jie Yan, J. Ping Liu

Laser-induced breakdown spectroscopy (LIBS) technology is an appealing technique compared with many other types of elemental analysis because of the fast response, high sensitivity, real-time, and noncontact features. One of the challenging targets of LIBS is the enhancement of the detection limit. In this study, the detection limit of gas-phase LIBS analysis has been improved by controlling the pressure and laser pulse width. In order to verify this method, low-pressure gas plasma was induced using nanosecond and picosecond lasers. The method was applied to the detection of Hg. The emission intensity ratio of the Hg atom to NO (IHg/ INO) was analyzed to evaluate the LIBS detection limit because the NO emission (interference signal) was formed during the plasma generation and cooling process of N2 and O2 in the air. It was demonstrated that the enhancement of IHg/INO arose by decreasing the pressure to a few kilopascals, and the IHg/INO of the picosecond breakdown was always much higher than that of the nanosecond breakdown at low buffer gas pressure. Enhancement of IHg/INO increased more than 10 times at 700 Pa using picosecond laser with 35 ps pulse width. The detection limit was enhanced to 0.03 ppm (parts per million). We also saw that the spectra from the center and edge parts of plasma showed different features. Comparing the central spectra with the edge spectra, IHg/INO of the edge spectra was higher than that of the central spectra using the picosecond laser breakdown process.

Published: 2013.   Source: Applied Spectroscopy 67(11):1242-51

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