APL4000 series

Picosecond Amplifiers for Multiple Stage OPCPA Pumping
Download
datasheet
  • Up to 8 channels × ≥2200 mJ or 8 channels × ≥130 mJ
  • Tailored according to pumping requirements
  • 90 ps pulses
  • 10 Hz or 1 kHz pulse repetition rate
  • Up to 8 channels × ≥2200 mJ or 8 channels × ≥130 mJ
  • Tailored according to pumping requirements
  • 90 ps pulses
  • 10 Hz or 1 kHz pulse repetition rate

Features & Applications

Features

  • High pulse energy up to 1 kHz rate
  • Two versions available:

– flash lamp pumped APL4100 providing 8 channels × ≥2200 mJ

– diode pumped APL4200 providing 8 channels × ≥130 mJ

  • Each of 8 channels can be tailored according to pumping requirements
  • Low maintenance costs
  • PC control via USB with supplied, LabVIEW™ drivers
  • Optional temperature stabilized second, third and fourth harmonic generators
  • Cooled by supplied water-to-water chiller

Applications

Multiple stage OPCPA pumping

Non-linear optics

Other spectroscopic and nonlinear optics applications

Description

APL4000 series picosecond amplifiers were designed and manufactured for multiple stage OPCPA pumping. Systems can be specialy tailored for customer‘s needs and have up to 8 pumping channels with different wavelength, energy, pulse duration, spatial and temporal profiles, adjustable delay, image translation to customers specified location and various other features.

Short pulse duration, excellent pulse-to-pulse stability, superior beam quality makes APL4200 series diode pumped picosecond amplifiers well suited for other applications like non-linear optics.

Regenerative amplifier/Power amplifier design

APL4000 series amplifiers consist of regenerative and power amplifiers. System could be seeded by built-in picosecond oscillator or other ultrafast laser system. Pulses from regenerative amplifier are spatially shaped and amplified in double-pass amplifiers with thermally induced birefringence compensation. Advanced optical design ensures smooth, without hot spots beam spatial profile at the laser output. Low light depolarization level allows high efficiency generation of up to 4th harmonic with build-in harmonic generators. Repetition rate and timing of the pulses can be locked to the external RF source (with –PLL option) or other ultrafast laser system (with –FS option).

Simple and convenient laser control

For customer convenience the amplifier can be controlled through Laser Control software via USB interface (control PC included). Alternatively, the amplifier can be controlled from personal computer with supplied software for Windows™ operating system. LabVIEW™ drivers are supplied as well.

Build-in harmonic generators

Angle-tuned LBO and/or BBO crystals mounted in temperature stabilized heaters are used for second, third and fourth harmonic generation. Harmonic separation system is designed to ensure high spectral purity of radiation and direct it to the output ports.

Specifications

ModelAPL4100APL4200
MAIN SPECIFICATIONS 1) 2)
Central wavelength
(optional 532 nm and 355 nm outputs available)
1064 nm
Output energy 3)up to 8 channels with 2200 mJup to 8 channels with 130 mJ
Pulse energy stability 4)≤ 1.5 %≤ 1.0 %
Pulse duration (FWHM) 5)90 ± 10 ps
Pulse repetition rate 6)10 Hz1 kHz
Spatial modesuper-Gaussian 7)
Beam diameter 8)~ 24 mm~ 8 mm
Beam divergence 9)≤ 0.5 mrad ≤ 0.7 mrad
Beam pointing stability 10)≤ 60 μrad≤ 30 μrad
Deviation of parameters between beams±10 %
Pre-pulse contrast> 200:1
Polarizationlinear
Polarization contrast> 100:1
PHYSICAL CHARACTERISTICS
Laser head size (W×L×H)1000 x 6000 x 500 mm (preliminary)1500 × 3000 × 400 mm (preliminary)
Power supply size (W×L×H)550 x 600 x 1231 mm – 3 units (preliminary)553 × 600 × 1200 mm – 1 unit
553 × 600 × 500 mm – 1 unit
Maximum umbilical lengthup to 10 m (must be confirmed when ordering)
OPERATING REQUIREMENTS
Warm up time< 45 min< 30 min
Total water consumption< 25 l/min, 2 bar, 20 °C< 20 l/min, 2 bar, 20 °C
Relative humidity20 – 80 % (non condensing)
Operating ambient temperature22 ± 2 °C
Mains voltage 11)208, 380 or 400 V AC, three phases, 50/60 Hz
Power rating< 12 kVA< 22 kVA
Cleanness of the roomISO Class 7 or 10000 as per U.S. Fed Std. 209 (5 VDI 2083, C GMP)
Vacuum supplybetter than 10-2 Torr
  1. Due to continuous improvement, all specifications are subject to change. Parameters marked typical are illustrative; they are indications of typical performance and will vary with each unit we manufacture.
  2. All parameters measured at 1064 nm if not stated otherwise.
  3. All channels can be specially tailored for customer‘s needs and have different wavelength, energy, pulse duration, spatial and temporal profiles, adjustable delay, image translation to customers specified location and various other features.
  4. RMS, measured over 30 s.
  5. Optional pulse duration available down to 20 ps. Inquire for pulse energies.
  6. Should be specified when ordering. Inquire for custom pulse repetition rates.
  7. Super-Gaussian spatial mode will be of 6–11th order in near field. Inquire for other spatial beam shapes.
  8. Beam diameter is measured at 1064 nm at the 1/e² level.
  9. Full angle measured at the 1/e² level at 1064 nm.
  10. Beam pointing stability is evaluated as movement of the beam centroid in the focal plane of a focusing element.
  11. Voltage fluctuations allowed are +10 % / -15 % from nominal value.

Performance

Publications

Found total :
1 article, 1 selected
Application selected :
All Applications
All Applications
Scientific Applications
High Intensity Sources – laser produced plasma, x-ray source
OPCPA Systems – optical parametric chirped pulse amplification system

53 W average power CEP-stabilized OPCPA system delivering 5.5 TW few cycle pulses at 1 kHz repetition rate

Related applications:  High Intensity Sources OPCPA Systems

Authors:  R. Budriūnas, T. Stanislauskas, J. Adamonis, A. Aleknavičius, G. Veitas, D. Gadonas, S. Balickas, A. Michailovas, A. Varanavičius

We present a high peak and average power optical parametric chirped pulse amplification system driven by diode-pumped Yb:KGW and Nd:YAG lasers running at 1 kHz repetition rate. The advanced architecture of the system allows us to achieve >53 W average power combined with 5.5 TW peak power, along with sub-220 mrad CEP stability and sub-9 fs pulse duration at a center wavelength around 880 nm. Broadband, background-free, passively CEP stabilized seed pulses are produced in a series of cascaded optical parametric amplifiers pumped by the Yb:KGW laser, while a diode-pumped Nd:YAG laser system provides multi-mJ pump pulses for power amplification stages. Excellent stability of output parameters over 16 hours of continuous operation is demonstrated.

Published: 2017.   Source: Optical Society of America | Vol. 25, No. 5 | 6 Mar 2017 | OPTICS EXPRESS 5799

Send request about APL4000